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High-temperature-crosslinkable water-soluble resin, preparation method thereof and chemical-treatment-free negative-image-type thermosensitive CTP plate coating

A water-soluble resin and high-temperature technology, which is used in photosensitive materials for optomechanical equipment, chemical industry, climate sustainability, etc., can solve problems such as low printing force, poor plate-base binding force, and difficulty in forming image contrast , to achieve the effect of improving the imaging contrast of the coating and improving the firmness

Active Publication Date: 2021-03-19
BEIJING INSTITUTE OF GRAPHIC COMMUNICATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But in the process of application: First, during the exposure process of this type of plate, there are many physical changes and few chemical changes, so the energy required for imaging is high, and it is difficult to form obvious image contrast; The phase change changes the affinity of the coating, but the binding force with the plate base is poor, which makes the printing process poor wear resistance and low printing force

Method used

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  • High-temperature-crosslinkable water-soluble resin, preparation method thereof and chemical-treatment-free negative-image-type thermosensitive CTP plate coating
  • High-temperature-crosslinkable water-soluble resin, preparation method thereof and chemical-treatment-free negative-image-type thermosensitive CTP plate coating
  • High-temperature-crosslinkable water-soluble resin, preparation method thereof and chemical-treatment-free negative-image-type thermosensitive CTP plate coating

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preparation example Construction

[0053] The present invention provides the preparation method of the high-temperature cross-linkable water-soluble resin described in the above technical solution, comprising the following steps:

[0054] (1) performing a radical coupling reaction with the compound of formula 2 and peroxide or azo compound in an alcohol solvent to obtain the first monomer of the structure of formula 3; the peroxide or azo compound Such compounds are dibenzoyl peroxide, acetyl peroxide, azobisisobutyronitrile, di-tert-butyl peroxide or dicyclohexyl peroxide;

[0055]

[0056] (2) Under nitrogen protection, the first monomer of the structure shown in formula 3 and the second monomer of the structure shown in formula 4 are mixed in ethyl acetate or 1,4-diol under the action of an initiator. Radical polymerization is carried out in oxane to obtain the high-temperature cross-linkable water-soluble resin.

[0057]

[0058] In the present invention, the compound of formula 2 is subjected to fre...

Embodiment 1

[0074] (1) Preparation of intermediates with oxynitride structure

[0075] In a 500mL flask, 17.2g of 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl radical and 31g of isocyanoethyl methacrylate were treated with 200mL of diethyl methacrylate after dewatering. In glycol dimethyl ether, and under the protection of nitrogen, mix and stir for 6h, then separate liquid, purify and separate by oil phase chromatography to obtain 19.6g of intermediate compound (code-named M), the reaction equation is:

[0076]

[0077] figure 1 It is the NMR image of the intermediate M. In the NMR image, there is a characteristic peak of -NH at the chemical shift of 8.3 ppm, which fully proves that the reaction intermediate with the expected structure has been synthesized.

[0078] (2) Preparation of monomers

[0079] In a 250mL flask, 16.35g of the intermediate code-named M was dissolved in 100mL of methanol, 6.05g of dibenzoyl peroxide was dissolved in 50mL of methanol, and then the dibenzoyl p...

Embodiment 2

[0087] (1) Preparation of monomers

[0088] In a 250mL flask, 13.08g of the intermediate code M (same as Example 1) was dissolved in 100mL of methanol, 3.28g of azobisisobutyronitrile was dissolved in 50mL of methanol, followed by azobisisobutyronitrile methanol solution It was added dropwise to the methanol solution of the intermediate, and after 12 hours of reaction at room temperature, chromatographic separation and purification were performed to obtain 9.8 g of a monomer compound (codenamed N 2 ), the reaction formula is:

[0089]

[0090] Figure 4 is the monomeric compound N 2 The NMR image of , the characteristic peak of methyl H appears at the chemical shift of 1-2 ppm in the NMR image, which confirms that the monomer compound of the expected structure is obtained.

[0091] (2) Preparation of high temperature crosslinkable water-soluble resin

[0092] In a 250mL four-necked flask, a stirrer, a condenser tube and a dropping funnel were installed, and nitrogen was...

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Abstract

The invention provides high-temperature-crosslinkable water-soluble resin, a preparation method thereof and a chemical-treatment-free negative-image-type thermosensitive CTP plate coating, and relatesto the technical field of printing plate coating materials. The high-temperature-crosslinkable water-soluble resin has a structure as shown in a formula 1, and is formed by copolymerizing a nitrogenoxide structural unit and a water-soluble group structural unit. The high-temperature-crosslinkable water-soluble resin can be subjected to high-temperature crosslinking reaction under 830nm infraredlaser exposure to form an imaging layer with a three-dimensional network structure. The high-temperature-crosslinkable water-soluble resin is applied to the chemical-treatment-free negative-image-typethermosensitive CTP plate coating, and can effectively improve the imaging contrast of the coating and the adhesive force between the imaging layer and the plate base.

Description

technical field [0001] The invention relates to the technical field of printing plate coating materials, in particular to a high-temperature cross-linkable water-soluble resin, a preparation method thereof, and a chemical-free negative-type heat-sensitive CTP plate coating. Background technique [0002] In the printing industry, traditional analog printing is divided into four categories according to the different printing plates: offset printing (offset printing), letterpress printing (flexo printing), gravure printing and stencil printing (silk printing). Offset printing is a printing method commonly used in the production of printing and packaging, and is widely used in the printing, packaging and decoration of various paper materials. Various commodities contacted in daily life, such as books and magazines, food (including drinks, dairy products), clothing, textiles, medicine, cultural office supplies, etc., their products, packaging, and logos are mostly offset printing...

Claims

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Application Information

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IPC IPC(8): C08F220/36C08F220/06C08F226/10G03F7/004
CPCC08F220/36C08F220/06G03F7/004C08F226/10Y02P20/10
Inventor 安粒李仲晓张红丽史萍
Owner BEIJING INSTITUTE OF GRAPHIC COMMUNICATION
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