A kind of nitrogen dioxide sensor based on organic field effect transistor and preparation method thereof
A technology of nitrogen dioxide and transistors, which is applied in the field of nitrogen dioxide sensors based on organic field effect transistors and its preparation, can solve the problems of few characteristic parameters, low integration and low sensitivity, and achieve easy absorption, low cost, The effect of simple preparation process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0041] The preparation method is as follows:
[0042] S1: Thoroughly clean the glass substrate on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0043] S2: A PS film was prepared on ITO by spin coating to form a gate insulating layer of 100 nm;
[0044] S3: heating and baking the spin-coated PS film;
[0045] S4: spin-coating an organic semiconductor layer with a mass fraction ratio of 78%: 5%: 17% of P3HT, isoliquiritigenin and tert-butyl-4-hydroxyanisole 100 nm on the gate insulating layer;
[0046] S5: 100 nm copper source electrodes and drain electrodes are prepared by vacuum evaporation.
[0047] The nitrogen dioxide response characteristics of the device were tested, and the response to nitrogen dioxide was good at room temperature.
Embodiment 2
[0049] The preparation method is as follows:
[0050] S1: Thoroughly clean the glass substrate 1 on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0051] S2: A PMMA film was prepared on ITO by spin coating to form a gate insulating layer of 520 nm;
[0052] S3: heating and baking the spin-coated PMMA film;
[0053] S4: spin-coat an organic semiconductor layer with a mass fraction ratio of 73%: 10%: 17% of Tips-pentacene, isoliquiritigenin and tert-butyl-4-hydroxyanisole 150nm on the gate insulating layer;
[0054] S5: Prepare 10 nm silver source electrode and drain electrode by vacuum evaporation.
[0055] The nitrogen dioxide response characteristics of the device were tested, and the response to nitrogen dioxide was poor at room temperature.
Embodiment 3
[0057] The preparation method is as follows:
[0058] S1: Thoroughly clean the glass substrate 1 on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0059] S2: Prepare a PVA film on ITO by spin coating to form a gate insulating layer of 20 nm;
[0060] S3: heating and baking the spin-coated PVA film;
[0061] S4: spin-coat an organic semiconductor layer with a mass fraction ratio of 80%: 8%: 12% of Tips-pentacene, isoliquiritigenin and tert-butyl-4-hydroxyanisole 200nm on the gate insulating layer;
[0062] S5: A gold source electrode and a drain electrode of 40 nm are prepared by vacuum evaporation.
[0063] The nitrogen dioxide response characteristics of the device were tested, and the response to nitrogen dioxide was good at room temperature.
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com

