A kind of preparation method of cesium tin iodine thin film and application thereof
A thin film, cesium iodide technology, applied in the field of preparation of cesium tin iodide thin film, can solve the problem that the stoichiometry of CsSnI3 thin film is difficult to accurately control the spatial distribution, the carrier migration length and lifetime are short, Sn and Cs vacancy defects, etc. problems, to achieve the effect of reducing vacancy defects, low price and high film quality
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Embodiment 1
[0026] A kind of preparation method of cesium tin iodine film, comprises the following steps:
[0027] Put tin diiodide and cesium iodide into quartz crucibles respectively, and then heat and degas them in an ultra-high vacuum environment, and keep the vacuum in the vacuum chamber not lower than 10 -6 Pa; at the same time, blow a certain amount of liquid nitrogen into the cooling tube of the sample stage to reduce the temperature of the Au(111) substrate to -28°C; then heat the tin diiodide and cesium iodide evaporation sources to 440°C and 210°C After that, tin diiodide and cesium iodide are deposited together on the Au(111) substrate. During the deposition process, CsI and SnI 2 A better stoichiometric reaction can occur; wherein, during the deposition process, tin diiodide and cesium iodide were co-deposited at a rate of 0.5 layer / min for 30 minutes;
[0028] The cesium tin iodide film precursor deposited on the substrate was heated to 120 °C at a rate of 3.5 °C / min and an...
Embodiment 2
[0030] Same as Example 1, except that: the temperature of the Au(111) substrate is controlled at -23° C.; the annealing time is 30 min.
Embodiment 3
[0032] Same as Example 1, except that the temperature of the Au(111) substrate is controlled at -33° C., and the annealing time is 60 min.
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