Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A high-efficiency polishing disc with shear expansion characteristics and its preparation method

A technology of expansion characteristics and polishing discs, which is applied in the field of ultra-precision polishing, can solve the problems of small range and poor surface flatness of the polished workpiece, and achieve the effect of low cost, large processing contact area and good removal uniformity

Active Publication Date: 2022-05-03
ZHEJIANG UNIV OF TECH
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the range of applicable processing materials is small, and there is a problem of poor surface flatness of the polished workpiece

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A high-efficiency polishing disc with shear expansion characteristics and its preparation method
  • A high-efficiency polishing disc with shear expansion characteristics and its preparation method
  • A high-efficiency polishing disc with shear expansion characteristics and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0031] The preparation method of the high-efficiency polishing disc with shear expansion characteristics comprises the following steps:

[0032] 1) Preparation of materials with non-Newtonian fluid properties: After fully mechanically stirring the viscoelastic polymer, abrasive grains 7, and dispersant 8 in proportion, the mass percentage is: 69% to 85% of the viscoelastic polymer, with a particle size of 10% to 30% of abrasive particles between 0.05 and 50 μm, 1% to 5% of dispersant, and stand in an oven at 120 to 200°C for 2 to 5 hours to prepare a material with non-Newtonian fluid characteristics;

[0033] 2) Prepare the polishing layer 2. Method 1: Mix the adhesive, curing agent and other components according to the proportion, put them into the mold, heat them in the oven, and get a base plate with grooves after cooling, fill the above-mentioned materials with non-Newtonian fluid characteristics into the Obtaining the polishing layer 2; method 2: heating and melting the ...

Embodiment 1

[0048] refer to figure 1 and figure 2 , a high-efficiency polishing disc with shear expansion characteristics, comprising a polishing layer 2, a rigid layer 4 and an adsorption layer 5, the preparation method of the high-efficiency polishing disc comprises the steps of:

[0049] 1) 85g of viscoelastic polymer, 10g of diamond abrasive particles 7 with a particle size of 1.5μm, and 5g of sodium dodecylbenzenesulfonate 8 were fully mechanically stirred evenly, and then heated in an oven at 120°C for 2h to prepare a non-Newtonian Materials with fluid properties;

[0050] 2) Evenly mix 90% polyurethane binder and 10% curing agent to form a viscous mixture, put the viscous mixture into a mold, heat and press under a hot press, and let it stand for 24 hours Obtain the embryo body. Put the embryo body together with the mold into the oven, heat and dry it at 120°C for 2 hours, so that it can be fully cured to become the desired substrate. The substrate is placed on the grinder and...

Embodiment 2

[0057] refer to image 3 , a high-efficiency polishing disc with shear expansion characteristics, comprising a polishing layer 2, a rigid layer 4 and an adsorption layer 5, the preparation method of the high-efficiency polishing disc comprises the steps of:

[0058] 1) 78g of viscoelastic polymer, 20g of alumina abrasive particles 7 with a particle size of 1.5μm, and 2g of sodium dodecylbenzenesulfonate 8 were fully mechanically stirred evenly, and then heated in an oven at 150°C for 3h to prepare a molten state materials with non-Newtonian fluid properties.

[0059] 2) Prepare a piece of non-woven fabric, uniformly embed the material with non-Newtonian fluid characteristics in the molten state in the above step 1) in the non-woven fabric, and obtain the polishing layer 2 after cooling;

[0060] 3) Select a rigid polymer as the rigid layer 4, and bond it to the polishing layer through the resin bond 3;

[0061] 4) Attach the polishing disc to the polishing tool through doubl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

A high-efficiency polishing disc with shear expansion characteristics, comprising a flexible fixed abrasive, a polishing layer, a rigid layer, an adhesive layer and an adsorption layer, the flexible fixed abrasive is made of a viscoelastic rubber base with non-Newtonian fluid properties and an abrasive Granular composition, the flexible fixed abrasive components and their mass percentages are: 69% to 85% of viscoelastic polymer, 10% to 30% of abrasive particles with a particle size between 0.05 and 50 μm, and 1% to 5% of dispersant The polishing layer is filled with flexible fixed abrasives, the rigid layer is located below the polishing layer, the adhesive layer is located between the polishing layer and the rigid layer and the polishing layer and the rigid layer are bonded together, the adsorption The layer is bonded to the bottom surface of the rigid layer, and the adsorption layer is adsorbed on the base plate of the polishing equipment. And a preparation method of a high-efficiency polishing disk with shear expansion characteristics is provided. The invention can be used for plane polishing of difficult-to-machine hard and brittle materials, and has the advantages of high processing efficiency, good processing quality, low economic cost and the like.

Description

technical field [0001] The invention relates to the field of ultra-precision polishing, in particular to a polishing disc and a preparation method thereof, in particular to a high-efficiency polishing disc with shear expansion characteristics and a preparation method thereof. Background technique [0002] Polishing discs can be used for grinding and polishing the surface of materials, and there are many types, mainly including cast iron discs, stainless steel polishing discs, velvet polishing discs and pure iron polishing discs, etc. You can choose a suitable polishing disc according to the hardness of the polished workpiece. [0003] At present, difficult-to-machine hard and brittle materials such as ceramic materials, hard alloys, and refractory metals are widely used in aerospace, semiconductors, and vehicle parts and other fields. In the case of severe friction and high temperature and high pressure, parts with high roughness are easy to wear, which seriously shortens th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B24B37/14B24B37/16B24D3/28B24D3/32B24D3/34B24D18/00C08L85/04C08K3/04C08K5/42
CPCB24B37/14B24B37/16B24D3/28B24D3/32B24D3/344B24D18/0009C08K3/04C08K5/42C08L85/04
Inventor 陈泓谕许良吕冰海王国强李鹏徐绍振
Owner ZHEJIANG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com