Silicon carbide epitaxial furnace reaction chamber
An epitaxial furnace and reaction chamber technology, which is applied in the field of silicon carbide epitaxial furnace reaction chamber, can solve the problems of process condition damage, failure, and easy rupture of quartz tube water-cooled interlayer under stress, and achieves the effect of simple overall structure and high temperature failure prevention.
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[0016] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.
[0017] figure 1 An embodiment of the silicon carbide epitaxial furnace reaction chamber of the present invention is shown. The silicon carbide epitaxial furnace reaction chamber of this embodiment includes a quartz tube 1, a first sealing flange 2, a second sealing flange 3 and a sealing member 4 The outer periphery of the quartz tube 1 is provided with a water-cooled jacket 11 and the inside is provided with a reaction device 12. The first sealing flange 2 is sleeved on the outer periphery of the quartz tube 1 and abuts against the water-cooled jacket 11. The second sealing flange 3 is connected to the first The sealing flanges 2 are connected, and the sealing member 4 is interposed between the first sealing flange 2 and the second sealing flange 3. The second sealing flange 3 is provided with a heat insulating cylinder 31, and the e...
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