Corrosion-resistant film layer for bipolar plate of fuel cell and preparation method of corrosion-resistant film layer
A fuel cell and bipolar plate technology, applied in fuel cell parts, metal material coating process, coating and other directions, can solve the problem of poor bonding force between the graphite layer and the metal bipolar plate, the cost of fuel cells is difficult to reduce, and it is difficult to Realize problems such as mass production, and achieve the effects of short preparation time, enhanced bonding force, and improved durability.
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Embodiment 1
[0049] refer to figure 1 , this embodiment discloses a corrosion-resistant film layer for a fuel cell bipolar plate, including a Ti layer 2, a TiC layer 3, and a C layer 4 that are sequentially covered on the surface of a fuel cell bipolar plate 1, and the C layer 4 is a graphite C layer 4.
[0050] This embodiment also discloses a method for preparing a corrosion-resistant film for a fuel cell bipolar plate, comprising the following steps:
[0051] Step 1, ultrasonically clean the fuel cell bipolar plate to be coated with corrosion-resistant film, then place the cleaned fuel cell bipolar plate in a vacuum coating chamber and heat it to 230°C, vacuumize, and keep the temperature in the vacuum coating chamber The temperature is 230°C.
[0052] Step 2, wait for the background vacuum in the vacuum coating chamber to reach 5×10 -3 At Pa, argon gas was introduced, and the intake volume of argon gas was controlled to be 1400 sccm, the bias voltage was set to -1200 V, and the surf...
Embodiment 2
[0057] The difference with embodiment 1 only lies in:
[0058] In step 3, adjust the flow rate of argon gas to make the air pressure reach 0.28Pa, set the bias voltage to -120V, turn on the intermediate frequency coating power supply of the Ti target, and set the current of the Ti target close to the side wall of the vacuum coating chamber to 45A , set the current of the Ti target near the center of the vacuum coating chamber to 30A, deposit the Ti layer for 20min, and turn off the Ti target.
Embodiment 3
[0060] The difference with embodiment 1 only lies in:
[0061] In step 4, adjust the argon gas flow rate to make the air pressure reach 0.3Pa, set the bias voltage to -120V, turn on the intermediate frequency coating power supply of the Ti target and the C target at the same time, and set the Ti target close to the side wall of the vacuum coating chamber Set the current of the Ti target near the center of the vacuum coating chamber to 45A, set the current of the Ti target near the center of the vacuum coating chamber to 30A, set the current of the C target near the side wall of the vacuum coating chamber to 25A, and set the current of the C target near the center of the vacuum coating chamber For 14A, deposit the TiC layer for 8 minutes, and close the Ti target and C target at the same time.
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