Nitrogen-doped graphene, its preparation method and application
A nitrogen-doped graphene and nitrogen source technology is applied in the fields of nitrogen-doped graphene, nitrogen-doped graphene application, and nitrogen-doped graphene preparation, which can solve the problem that the number of layers is too large and high-quality nitrogen-doped graphene cannot be obtained. Problems such as heterographene, poor product crystal form, etc., to achieve the effect of high quality, highly adjustable doping level, and excellent performance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0048] The first aspect of the present invention discloses a method for preparing nitrogen-doped graphene, comprising the following steps:
[0049] forming a rotating arc region comprising a central portion and an edge portion;
[0050] The nitrogen source is guided to the center, the carbon source is guided to the edge, and the nitrogen-doped graphene is obtained by reacting under the arc initiation.
[0051] Starting from the existing technology, the present invention innovatively proposes a method for preparing nitrogen-doped graphene. Firstly, a rotating arc area is formed, and then the nitrogen source is guided to the center of the rotating arc area, and the carbon source is guided to the rotating arc area. At the edge of the region, under the arc, the nitrogen source is activated into nitrogen-containing active molecules in the center, while the carbon source flows through the edge and rapidly cracks, and reacts with the nitrogen-containing active molecules under the act...
Embodiment 1
[0069] The magnetic rotating arc device in this embodiment refers to figure 1 , wherein the inner diameter of the annular anode 4 is 25mm, and the diameter of the rod-shaped cathode 3 is 8mm, which are all made of high-purity graphite with a purity of not less than 99.99%. The annular magnet 6 surrounding the annular anode 4 provides an axial magnetic field of 0.08T. Introduce argon gas into the magnetic rotary arc device to exhaust the air therein, and ignite the arc in the argon atmosphere to form a rotary arc area 9, with a discharge current of 120 amperes, a power of 15 kW, and a discharge pressure of 1 bar; Pure nitrogen is passed into the center of the rotating arc area 9 from the first air inlet 1, and the flow rate is 30 slm. After the electromagnetic performance is stable, ethylene is passed into the edge of the rotating arc area 9 from the second air inlet 2, and the flow rate is 2slm, the reaction was stopped after 30min, and the solid product attached to the inner ...
Embodiment 2
[0074] The magnetic rotating arc device in this embodiment refers to figure 1, wherein the inner diameter of the annular anode 4 is 25mm, and the diameter of the rod-shaped cathode 3 is 8mm, which are all made of high-purity graphite with a purity of not less than 99.99%. The annular magnet 6 surrounding the annular anode 4 provides an axial magnetic field of 0.08T. Introduce argon gas into the magnetic rotary arc device to exhaust the air therein, and ignite the arc in the argon atmosphere to form a rotary arc area 9, with a discharge current of 100 amperes, a power of 13 kW, and a discharge pressure of 1 bar; The mixed gas of nitrogen and argon is passed into the center of the rotating arc area 9 from the first air inlet 1, the flow rate of nitrogen gas is 15slm, and the flow rate of argon gas is 15slm. Pass into the edge of the rotating arc area 9, the flow rate is 4 slm, stop after 30 minutes of reaction, collect the solid product attached to the inner wall of the reaction...
PUM
| Property | Measurement | Unit |
|---|---|---|
| power | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
| current | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com



