Composite electron transport layer with efficient charge extraction and application thereof in perovskite solar cell
An electron transport layer, solar cell technology, applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problems of accelerated decomposition of perovskite materials, poor device stability, etc., to improve electron mobility, surface smoothness, and enhanced charge extraction. Effect
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Embodiment 1
[0040] 1. Cleaning of conductive substrate
[0041] The conductive substrate was cut according to the required size, and the etched substrate was successively cleaned with detergent solution, deionized water, acetone, ethanol and isopropanol for 15 min, and then washed with N 2 Air dry. On spin-coated dense TiO 2 Before, the cleaned substrate was subjected to ultraviolet ozone treatment for 20 minutes and stored for later use;
[0042] 2. TiO2 2 Preparation of dense layer
[0043] Place the cleaned conductive substrate in a homogenizer, use a pipette gun to draw a certain amount of dense layer precursor solution and drop it on the substrate, and dilute it by spin coating (spin coating at 500rpm for 5s, spin coating at 2000rpm for 30s) ) 0.15 μm titanium diisopropoxybisacetylacetonate (acetylacetonate) in n-butanol to form 20–25 nm thick TiO 2 Thin layer, followed by heat treatment on a hot plate at 135 °C for 10 min, and annealed at 500 °C for 30 min in air;
[0044] 3. ...
Embodiment 2
[0058] 1. Cleaning of conductive substrate
[0059] The conductive substrate was cut according to the required size, and the etched substrate was successively cleaned with detergent solution, deionized water, acetone, ethanol and isopropanol for 15 min, and then washed with N 2 Air dry. On spin-coated dense TiO 2 Before, the cleaned substrate was subjected to ultraviolet ozone treatment for 20 minutes and stored for later use;
[0060] 2. TiO2 2 Preparation of dense layer
[0061] Place the cleaned conductive substrate in a homogenizer, use a pipette gun to draw a certain amount of dense layer precursor solution and drop it on the substrate, and dilute it by spin coating (spin coating at 500rpm for 5s, spin coating at 2000rpm for 30s) ) 0.15 μm titanium diisopropoxybisacetylacetonate (acetylacetonate) in n-butanol to form 20–25 nm thick TiO 2 Thin layer, followed by heat treatment on a hot plate at 135 °C for 10 min, and annealed at 500 °C for 30 min in air;
[0062] 3. ...
Embodiment 3
[0076] 1. Cleaning of conductive substrate
[0077] The conductive substrate was cut according to the required size, and the etched substrate was successively cleaned with detergent solution, deionized water, acetone, ethanol and isopropanol for 15 min, and then washed with N 2 Air dry. On spin-coated dense TiO 2 Before, the cleaned substrate was subjected to ultraviolet ozone treatment for 20 minutes and stored for later use;
[0078] 2. TiO2 2 Preparation of dense layer
[0079] Place the cleaned conductive substrate in a homogenizer, use a pipette gun to draw a certain amount of dense layer precursor solution and drop it on the substrate, and dilute it by spin coating (spin coating at 500rpm for 5s, spin coating at 2000rpm for 30s) ) 0.15 μm titanium diisopropoxybisacetylacetonate (acetylacetonate) in n-butanol to form 20–25 nm thick TiO 2 Thin layer, followed by heat treatment on a hot plate at 135 °C for 10 min, and annealed at 500 °C for 30 min in air;
[0080] 3. ...
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Abstract
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