Preparation method of novel interface phase material
An interface phase and a new type of technology, applied in the field of preparation of new interface phase materials, can solve the problems of poor oxidation resistance and inability to apply high-temperature water vapor and high-speed gas environment, etc., to achieve the effect of prolonging the service life and good high temperature resistance and oxidation resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0033] A method for preparing a high-temperature-resistant and anti-oxidation novel interface phase material, comprising the following steps:
[0034] Step 1. Degumming the SiC fiber preform at a temperature of 500-700° C. and nitrogen atmosphere for 0.5-1 hour.
[0035]Step 2. Mix ethyl orthosilicate and absolute ethanol in a ratio of 17:12 by volume under a magnetic heating stirrer, then add the mixture of dilute hydrochloric acid and deionized water drop by drop, and continue to stir at a constant temperature for two Hours, a stable, transparent silica sol was obtained.
[0036] Step 3: Add an appropriate amount of SiC fibers treated in step 1 to the silica sol, impregnate, coat, and dry, and then keep it in a vacuum furnace at a constant temperature of 300~500°C for 1 hour to obtain a uniform SiO on the surface. 2 coated SiC fibers.
[0037] Step 4: Take 322.82g of concentrated phosphoric acid, add deionized water to dilute, and use a 500mL volumetric flask to constant v...
Embodiment 2
[0045] A method for preparing a high-temperature-resistant and anti-oxidation novel interface phase material, comprising the following steps:
[0046] Step 1. Degumming the SiC fiber preform at a temperature of 500-700° C. and nitrogen atmosphere for 0.5-1 hour.
[0047] Step 2. Mix ethyl orthosilicate and absolute ethanol in a ratio of 17:12 by volume under a magnetic heating stirrer, then add the mixture of dilute hydrochloric acid and deionized water drop by drop, and continue to stir at a constant temperature for two Hours, a stable, transparent silica sol was obtained.
[0048] Step 3: Add an appropriate amount of SiC fibers treated in step 1 to the silica sol, impregnate, coat, and dry, and then keep it in a vacuum furnace at a constant temperature of 300~500°C for 1 hour to obtain a uniform SiO on the surface. 2 coated SiC fibers.
[0049] Step 4: Take 322.82g of concentrated phosphoric acid, add deionized water to dilute, and use a 500mL volumetric flask to constant ...
Embodiment 3
[0057] A method for preparing a high-temperature-resistant and anti-oxidation novel interface phase material, comprising the following steps:
[0058] Step 1. Degumming the SiC fiber preform at a temperature of 500-700° C. and nitrogen atmosphere for 0.5-1 hour.
[0059] Step 2. Mix ethyl orthosilicate and absolute ethanol in a ratio of 17:12 by volume under a magnetic heating stirrer, then add the mixture of dilute hydrochloric acid and deionized water drop by drop, and continue to stir at a constant temperature for two Hours, a stable, transparent silica sol was obtained.
[0060] Step 3: Add an appropriate amount of SiC fibers treated in step 1 to the silica sol, impregnate, coat, and dry, and then keep it in a vacuum furnace at a constant temperature of 300~500°C for 1 hour to obtain a uniform SiO on the surface. 2 coated SiC fibers.
[0061] Step 4: Take 322.82g of concentrated phosphoric acid, add deionized water to dilute, and use a 500mL volumetric flask to constant ...
PUM
Property | Measurement | Unit |
---|---|---|
Thermal expansion coefficient | aaaaa | aaaaa |
Thermal expansion coefficient | aaaaa | aaaaa |
Thermal expansion coefficient | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com