Variable magnetic field magnetron sputtering coating device and preparation method of high-conductivity carbon-based coating
A magnetron sputtering coating, sputtering coating technology, applied in the direction of sputtering coating, coating, metal material coating process, etc., can solve the difficulty of obtaining high conductivity and excellent corrosion resistance carbon-based coating at the same time, etc. problem, to achieve the effect of increasing the sp2 bond content, high conductivity, and increasing the coverage area
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0054] Another aspect of the embodiments of the present invention provides a method for preparing a highly conductive carbon-based coating, the preparation method is mainly implemented based on the variable magnetic field magnetron sputtering coating device, and the preparation method includes:
[0055] Set the substrate to be coated on the rotating mechanism in the vacuum chamber;
[0056] A chromium target is set on the first variable magnetic field magnetron cathode, and a carbon target is set on the second variable magnetic field magnetron cathode;
[0057] In a protective atmosphere, use the chromium target as the sputtering target, adjust the angle of the permanent magnetic column outside the first variable magnetic field magnetron cathode by rotating the connecting shaft, and apply a high-energy pulse voltage to the first variable magnetic field magnetron cathode ; Simultaneously applying a negative electrode pulse voltage to the substrate, thereby forming a metal chrom...
Embodiment 1
[0075] refer to figure 1 , the embodiment of the present invention provides a variable magnetic field magnetron sputtering coating device, including a vacuum chamber 1, a variable magnetic field magnetron cathode, a turntable 22, an auxiliary cathode 32, and a vacuum assembly 11 communicated with the vacuum chamber 1 A sputtering coating area is arranged inside the vacuum chamber 1 ; the variable magnetic field magnetron cathode is used to sputter a predetermined film material to the substrate 21 on the sample holder 2 arranged in the vacuum chamber 1 .
[0076] Wherein, the variable magnetic field magnetron cathode includes a first variable magnetic field magnetron cathode 4 and a second variable magnetic field magnetron cathode 3, a chromium target 41 is set on the first variable magnetic field magnetron cathode 4, and a second variable A carbon target 31 is arranged on the magnetic field magnetron cathode 3; in the present embodiment, the specific structures of the first va...
Embodiment 2
[0102] In this embodiment, based on the variable magnetic field magnetron sputtering coating device of Embodiment 1, a conductive carbon film is prepared on a 316L stainless steel substrate, and the specific process is as follows:
[0103] In this embodiment, a conductive carbon film is prepared on a 316L stainless steel substrate, and the specific process is as follows:
[0104] (1) First, after the base material 21 to be coated is ultrasonically treated and dried, it is pasted on the sample holder 2 and placed on the turntable 22 in the vacuum chamber 1, wherein the first variable magnetic field magnetron cathode 4 The installation target is a chromium target, the installation target of the second variable magnetic field magnetron cathode 3 is a carbon target, and the vacuum assembly 11 is opened for vacuuming.
[0105] (2) When the vacuum degree reaches the requirement, introduce argon gas, adjust the air pressure to 20mTorr, apply a 650V pulse negative bias on the sample h...
PUM
| Property | Measurement | Unit |
|---|---|---|
| magnetic flux density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More