Local passivation contact IBC battery structure and preparation method thereof
A local, passivation film technology, applied in the field of solar cells, which can solve problems such as optical loss
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[0024] An IBC solar cell with partial back passivation contact, comprising a P-type crystalline silicon substrate 100, the back surface of the P-type crystalline silicon substrate 100 sequentially includes tunnel oxide layers 200, alternately arranged back surface n+ doped The impurity layer 300 and the p+ doped region 101 at the groove on the back surface, the passivation film 503 on the back surface, and the metal electrode on the back surface; Front surface passivation film 501 and anti-reflection film 502;
[0025] The antireflection film 502 includes SiO 2 and / or Al 2 o 3 dielectric film and SiNx dielectric film or SiOxNy, the SiO 2 The thickness of the dielectric film is 1-5nm, and the Al 2 o 3 The thickness of the dielectric film is 2-20nm, the thickness of the SiNx dielectric film is 40-100nm, and the thickness of the SiOxNy dielectric film is 40-100nm;
[0026] The tunnel oxide layer 200 and the n+ doped layer 300 constitute the emitter region on the back surfac...
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