Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin

A technology containing sulfur benzophenone and sulfur benzophenone, applied in application, coating, ink, etc., can solve problems such as slow curing rate, easy yellowing of cured coating, and irritating odor of toxic substances. Achieve excellent flexibility and high self-initiation efficiency

Inactive Publication Date: 2021-11-30
SHAOGUAN HEZHONG CHEM CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it still has disadvantages such as slow curing rate, easy yellowing of the cured coating, easy migration to

Method used

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  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin
  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin
  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0049] Example 1:

[0050] Preparation of 3-generation dendritic polymer HPB-3, the following steps: by 15.6 parts of neopentyl glycol, 40.6 parts of 2,2-dimethylol propionic acid, 12.5 parts of xylene, 0.2 parts of p-toluenesulfonic acid catalyst was added four-necked flask equipped with a stirrer, thermometer, addition funnel and a reflux trap, the nitrogen was heated to reflux at 140 ~ 150 ℃ 1 ~ 2h, detected when the acid value is below 25mgKOH / g, were added 80.4 parts of 2,2-dimethylolpropionic acid, 0.4 parts of p-toluenesulfonic acid and 16.0 parts of xylene, at 140 ~ 150 ℃ refluxed 1 ~ 2h, detected when the acid value is below 25mgKOH / g, then were added 160.8 parts of 2,2-dimethylolpropionic acid, 0.8 parts of p-toluenesulfonic acid and 32.0 parts of xylene, at 140 ~ 150 ℃ reaction was refluxed for 2h, warmed to 180 [deg.] C reaction was continued until the acid value of the detected low to 20mgKOH / g, the reaction is stopped; xylene was distilled off under reduced pre...

Example Embodiment

[0051] Example 2:

[0052] Preparation of an isocyanate - functional acrylic monomer TDI-HEMA: equipped with a reflux condenser, a four-necked flask with a thermometer, a dropping funnel and a stirrer was charged with 104.4 parts of TDI-80 and 0.07 parts of DBTDL, heating was stirred at 30 ~ 45 ℃ was slowly added dropwise 78.0 parts of methacrylic acid -α- hydroxyethyl methacrylate, 0.12 parts of hydroquinone and 40.0 parts of a mixture consisting of acetone, the addition was complete, warmed to 45 ~ 50 ℃ reaction was continued for 3.5 h, followed by sampling every 30min NCO value detection system is stopped when half the initial value detected NCO reaction, cooling to 40 ℃, to obtain an isocyanate - functional acrylic monomer TDI-HEMA.

Example Embodiment

[0053] Example 3:

[0054] Preparation of an isocyanate - functional acrylic monomer IPDI-HEA: equipped with a reflux condenser, a four-necked flask with a thermometer, a dropping funnel and a stirrer were added 44.5 parts of IPDI and 0.03 parts of DBTDL, heated with stirring, slowly at 30 ~ 45 ℃ 23.2 parts of hydroxyethyl acrylate was added dropwise -β- acrylate, 0.03 parts of hydroquinone and 20.0 parts of a mixture consisting of acetone, the addition was complete, warmed to 45 ~ 50 ℃ reaction was continued for 3h, then sampled every 30min NCO value detection system , NCO stopped when half the initial value of the detection reaction, cooling to 40 ℃, to obtain an isocyanate - functional acrylic monomer IPDI-HEA.

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Abstract

The invention relates to sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin and a preparation method thereof. The self-initiation UV resin takes neopentyl glycol as a core, has a Boltom type dendritic structure and contains a plurality of functional active groups, a plurality of sulfur-containing benzophenone photo-initiation groups and a plurality of branched chain bulk alkane groups. The resin has pigment bearing performance, high solid content, low viscosity and storage stability. The self-initiation efficiency is high, and the defects of low curing rate, easy yellowing of a coating, surface migration, strong volatility, large heat loss, generation of harmful substances and pungent smell and the like of an additional BP initiator are overcome. The dendritic self-initiation UV resin prepared by the invention has excellent flexibility, adhesive force, chemical resistance, heat resistance, aging resistance, oil resistance, wear resistance, pollution resistance and impact strength, is odorless in coating, and can be used for UV colored floor coatings, UV wood coatings, UV alloy coatings, UV circuit board ink and UV plastic coatings.

Description

technical field [0001] The invention relates to a modified self-initiating photocurable resin, in particular to a sulfur-containing benzophenone-modified third-generation dendritic self-initiating UV resin and a preparation method thereof, belonging to the technical field of synthetic resins. Background technique [0002] In recent years, environmentally friendly coatings, including high solids and solvent-free coatings, water-based coatings, powder coatings and light-curing coatings, have achieved rapid development. Light curing technology has the advantages of fast curing, high production efficiency, room temperature operation, low energy consumption, low VOC, environmental protection, high quality, economy, and is suitable for a variety of substrates. It has been widely used in printing, packaging, advertising, building materials, decoration, electronics, etc. , communications, computers, stores, automobiles, aviation, aerospace, instrumentation, sports, health and many o...

Claims

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Application Information

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IPC IPC(8): C08G63/91C08G63/02C08G83/00C09D167/06C09D187/00C09D11/101
Inventor 许钧强孙小光周强富康伦国姚东生郭红桥
Owner SHAOGUAN HEZHONG CHEM CO LTD
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