Micro-LED optical information sensing and storage unit, photonic integrated chip, array and preparation method
A technology of storage unit and storage array, applied in information storage, static memory, digital memory information, etc., can solve the problems of data transmission energy and efficiency loss, complex integration process, low integration degree, etc., to improve signal processing efficiency, simplify Circuit structure, the effect of high integration
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Embodiment 1
[0042] This embodiment provides an information sensing and storage unit of a photonic integrated chip, such as figure 1 As shown, it includes Micro-LEDs, smoothing layers, ferroelectric semiconductors, dielectric layers and passivation layers that are sequentially aligned and stacked from bottom to top, and also includes source, drain and gate. The source and drain They are respectively embedded on both sides of the bottom of the dielectric layer and are in contact with the ferroelectric semiconductor, and the gate is embedded in the bottom of the passivation layer and located in the middle above the dielectric layer.
[0043]Among them, the microLED uses III-V compound light-emitting materials, which has the advantages of high brightness and high integration, and is an excellent choice for on-chip light sources. The substrate of the microLED can be a rigid substrate such as sapphire, silicon, silicon carbide, gallium nitride, or a flexible substrate such as a polymer such as ...
Embodiment 2
[0050] This embodiment provides a photonic integrated chip, including an array composed of several information sensing and storage units of the photonic integrated chip described in Embodiment 1, such as figure 2 shown.
Embodiment 3
[0052] This embodiment provides a preparation method for the information sensing and storage unit of the photonic integrated chip described in Embodiment 1, refer to image 3 shown, including the following steps:
[0053] Step A1, obtaining a micro-LED on a silicon substrate.
[0054] The substrate of the microLED can be a steel base material such as sapphire, silicon, silicon carbide, gallium nitride, etc., or a flexible base such as a high molecular polymer such as PET. The LED epitaxial layer includes P-type semiconductors, quantum wells, The N-type semiconductor and the semiconductor material of the buffer layer between the substrate and the semiconductor material are mainly compounds of Group III and V materials such as GaN, InGaN, and AlGaN. Evaporated electrodes form the contacts of the micro-LED, and the electrode materials can be Au, Ag, Cu, ITO, etc.
[0055] Step A2, deposit a smooth layer on the micro-LED, the material can be SiO x , SiN x , AlO x etc., and th...
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