Method for adjusting ordered arrangement of single-layer nano-microsphere array by adopting continuous sound waves
A nano-microsphere, continuous technology, applied in the process, coating, microstructure technology and other directions used to produce decorative surface effects, can solve the problems of irregular arrangement of microsphere arrays, and achieve the optimization of long-range order, The effect of low cost and low experimental environment
Pending Publication Date: 2022-05-06
INT ACAD OF OPTOELECTRONICS AT ZHAOQING SOUTH CHINA NORMAL UNIV
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[0004] In view of the deficiencies in the prior art above, the purpose of the present invention is to provide a method for adjusting the orderly arrangement of a single-layer nano-microsphere array by using continuous sound waves, so as to solve the defects in the traditional method for preparing a single-layer microsphere array film. The present invention solves the problem of irregular arrangement of microsphere arrays on the microscopic level by using macroscopic methods and automated means
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Embodiment 1
[0034] A method for adjusting the orderly arrangement of a single-layer nano-microsphere array using continuous sound waves, comprising the steps of:
[0035] 1) Substrate cleaning and hydrophilization treatment: first cut the silicon wafer into 2cm*2cm size, then use acetone, isopropanol, absolute ethanol, and deionized water to ultrasonically clean it for 10 minutes, and after drying, put the silicon wafer into the plasma In the washing machine, adjust the power parameter to 30W, the environmental parameter to air environment, and the flow rate to 10sccm. After completing the settings, start vacuuming. When the pressure is less than or equal to 38Pa, turn on the cleaning switch for 10 minutes and then turn it off. Open the air inlet and open the chamber. Take out the substrate from the door and put it into the sample box for airtight storage.
[0036] 2) Preparation of PS microsphere array: Clean a petri dish with a diameter of 30 cm and fill it with deionized water, place t...
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Abstract
The invention belongs to the technical field of micro-nano structure preparation, and particularly relates to a method for adjusting ordered arrangement of a single-layer nano microsphere array by adopting continuous sound waves. Comprising the following steps: S1, cleaning a substrate, and carrying out hydrophilic treatment; s2, preliminarily forming a single-layer film array from the nano-microsphere turbid liquid through self-assembly of a gas-liquid interface; s3, adjusting the nano-microsphere single-layer film array prepared in the step S2 by utilizing continuous sound waves, so that the nano-microsphere single-layer film array is arranged in order; and S4, gathering and transferring the ordered microsphere array prepared in the step S3 to the substrate treated in the step S1, and evaporating residual moisture of the sample. According to the preparation method, the order degree of arrangement of the nano-microsphere array can be improved, the problems that defects exist in array forming in a traditional preparation method and unequal intervals between units cannot be independently changed are solved, a brand-new reference scheme is provided for preparing a large-area ordered array through the nano-sphere photoetching technology, and a new breakthrough is brought to the NSL technology.
Description
technical field [0001] The invention belongs to the technical field of micro-nano structure preparation, and specifically relates to a method for adjusting the orderly arrangement of a single-layer nano-microsphere array by using continuous sound waves. Background technique [0002] Nanosphere lithography (NSL) is a simple, economical and effective lithography technology, which uses highly monodisperse nanospheres as a deposition or etching mask, combined with physical or chemical deposition methods to obtain shape and size controllable nanoarrays. NSL technology is an inexpensive method to quickly prepare nano-surfaces in the laboratory. Because of its high-throughput, low-cost, parallel process design and application to a variety of substrates, it has been widely used in many fields. The current NSL technology usually utilizes close-packed hexagonal nanometer to micrometer-sized polystyrene (PS) microspheres, silicon dioxide (SiO 2 ) latex spheres or polymethyl methacryl...
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Login to View More IPC IPC(8): B81C1/00
CPCB81C1/00031
Inventor 埃泽尔·马丁·阿金诺古何冠洲王新周国富迈克尔·吉斯格
Owner INT ACAD OF OPTOELECTRONICS AT ZHAOQING SOUTH CHINA NORMAL UNIV