Tungsten trioxide/manganese tungstate/cobalt tungstate photoelectrode material and preparation method and application thereof
A photoelectrode, manganese acetate technology, applied in the direction of electrodes, electrolytic components, electrolytic process, etc.
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[0026] The present invention provides a WO 3 / MnWO 4 / CoWO 4 The preparation method of the photoelectrode material includes the following steps:
[0027] (1) manganese acetate, cobalt acetate and water are mixed to obtain metal salt mixed solution;
[0028] (2) Put WO 3 The film is immersed in the metal salt mixed solution for in-situ hydrothermal reaction to obtain WO loaded with mixed metal salts 3 film; the WO 3 The film includes a substrate and WO supported on the surface of the substrate 3 Nanoplate particles;
[0029] (3) WO loaded with mixed metal salts 3 The films were washed, dried and calcined sequentially to obtain WO 3 / MnWO 4 / CoWO 4 photoelectrode material.
[0030] In the present invention, manganese acetate, cobalt acetate and water are mixed to obtain a metal salt mixed solution. In the present invention, the molar ratio of the manganese acetate and cobalt acetate is preferably 50-100:1, more preferably 50-70:1; the concentration of manganese aceta...
Embodiment 1
[0045] Preparation of WO 3 Film: Weigh 0.1237g sodium tungstate and dissolve it in 30mL water to prepare a sodium tungstate solution; weigh 0.1172g ammonium oxalate and dissolve it in 30mL water to prepare an ammonium oxalate solution; then add 10mL to the prepared sodium tungstate solution A hydrochloric acid solution with a concentration of 3 mol / L was magnetically stirred until the solution formed a white suspension, then the prepared ammonium oxalate solution was added, and the solution returned to a clear solution. Transfer the clear solution to a 100mL reactor with an area of 5×2.5cm 2 The FTO was washed three times with ethanol, acetone and ultrapure water respectively, and the cleaned FTO was completely immersed in the clear solution in the lining of the reactor with the conductive side facing down, then the autoclave was sealed and hydrothermally heated at 140 °C for 4 h . After the reactor is cooled, take out the WO 3 The film was wiped off the 7mm edge, washed ...
Embodiment 2
[0054] Preparation of WO 3 Film: Same as Example 1.
[0055] Weigh 0.5 g of manganese acetate, 0.01 g of cobalt acetate and 30 mL of water, mix, stir and dissolve to obtain a metal salt mixture; cut the area into 3 × 2.5 cm 2 WO 3 The conductive surface of the film was immersed in a mixed solution of metal salts, and the in-situ hydrothermal reaction was performed at 130 °C for 4 h to obtain WO loaded with mixed metal salts. 3 film, then the WO supported with mixed metal salts 3 The film was washed three times with deionized water, dried at room temperature naturally, and then calcined, heated to 650 °C at a heating rate of 3 °C / min, calcined for 3 h in an air atmosphere, and then cooled in a concentrated hydrochloric acid solution. Soak for 60min, then wash and dry to get WO 3 / MnWO 4 / CoWO 4 photoelectrode material.
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Abstract
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