EDA algorithm, application and simulation method for P-type GaN quantum well device transport characteristics
A simulation method and quantum well technology, which are applied in quantum computers, complex mathematical operations, design optimization/simulation, etc., can solve problems such as the inability to accurately describe the internal mechanism, the coupling effect of complex energy bands, and the inability to describe the structure of valence band quantum wells, etc. Achieve the effect of low cost, promotion of application, and convenience and compatibility
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Embodiment 1
[0049] An EDA algorithm used to study the transport characteristics of P-type GaN quantum well devices, the EDA algorithm is established based on the k×p perturbation algorithm, and simulates the valence band subband structure of the GaN / AlN heterojunction quantum well.
Embodiment 2
[0051] (I) The EDA algorithm is based on the quantum k×p perturbation method, which requires solving the Schrödinger equation shown in equation (1):
[0052] [H(k x,y ,k z )+I·V(z)]·ψ k (z)=E(k x,y )·ψ k (z) (1)
[0053] where H(k x,y ,k z ) is the quantized Hamiltonian matrix, I is the identity matrix, V(z) is the potential barrier in the quantum well, ψ k (z) is the wave function;
[0054] (II) Using operator In place of the kz term in the matrix, the Hamiltonian matrix of wurtzite GaN of formula (2) is quantized:
[0055]
[0056] in,
[0057] (III) By using the finite difference method and solving the Poisson-Schrödinger equation self-consistently, the formula (1) can be discretized into Nz nodes in the z direction, and transformed into solving a 6Nz×6Nz complex Hermitian matrix eigenvalue The problem is to obtain the valence band subband structure of the GaN / AlN heterojunction quantum well.
Embodiment 3
[0059] according to figure 1 As shown, through the EDA algorithm of the present invention, the two-dimensional iso-energy surface diagram of the valence band of the GaN / AlN quantum well grown along the (0001) crystal plane is calculated. The isotropic nature restricts the choice of the best stress type. Therefore, simulations are performed by utilizing uniaxial stresses that can lead to band anisotropy.
[0060] according to figure 2 As shown, the uniaxial compressive stress shear component directions of 0°, 45°, 90° and 135° are applied to the GaN / AlN heterojunction and the channel direction, respectively. After applying uniaxial compressive stress, the quantum well subband shape changes such as image 3 shown. Under stress, the energy rises or falls, with the lowest energy positions having the highest hole density of states and leading the modulation of hole mobility. Therefore, the change of energy at different positions can be observed from the change of the shape of...
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