Method for improving L10-Fept thin film performance with surface activating agent
A surfactant, L10-fept technology, applied in the direction of coating with magnetic layer, cathode sputtering application, sputtering coating, etc., to achieve small surface free energy, reduce ordering temperature, and improve ordering degree of effect
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[0011] The film was prepared in a magnetron sputtering apparatus. First, the glass substrate is ultrasonically cleaned with organic chemical solvents, deionized water and alcohol, and then mounted on the sample base of the sputtering chamber. The substrate is kept at room temperature. Sputtering chamber background vacuum 3×10 -5 Pa, under the condition of argon gas (purity 99.99%) pressure 0.45 Pa during sputtering, bismuth Bi (200 ) and iron platinum FePt (200 ) are deposited sequentially to prepare Bi (200 ) / FePt (200 ) thin film , Deposit Bi (400 ) and FePt (300 ) to prepare Bi (400 ) / FePt (300 ) thin film. The sample after sputtering is quickly in the vacuum degree of 2×10 -5 Heat treatment in Pa vacuum annealing furnace. It can be seen from Figure 1 that the FePt film without a Bi layer has a higher coercivity (6.8kOe) after annealing at 400°C, while Bi(200) / FePt(200) and Bi(400) / FePt(300) film, the coercivity values reached 10.4kOe and 5.3kOe respectively afte...
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