Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Light scattering reflection substrate?use photosensitive resin composition, light scattering reflection substrate, and production methods therefor

A technology of photosensitive resin and reflective substrate, applied in the field of photosensitive resin composition for light scattering/reflective substrate, light scattering/reflective substrate, which can solve the limitation of manufacturing method selection, lack of sufficient, adhesion (poor adhesion, etc. question

Inactive Publication Date: 2004-01-14
NIPPON SHEET GLASS CO LTD
View PDF2 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the above-mentioned conventional light-scattering / reflecting substrate, the light-scattering film itself is composed of 100% organic material, which differs from the reflective film formed of an inorganic material formed on the light-scattering film in terms of chemical properties and thermal expansion. Because of the difference in the ratio, the adhesion (adhesion) between the light scattering film and the reflective film is poor, and there is a problem that the reflective film is easy to peel off.
In addition, since the light-scattering film made of organic materials releases the adsorbed components in the organic material or internal unreacted components in the form of gas, there is also a problem of deterioration of the reflective film.
[0005] Furthermore, organic materials do not have sufficient room for the durability and chemical resistance required for LCDs, and since the glass transition temperature (Tg) and decomposition temperature are low, it is not possible to control the reflective film in the process of forming a reflective film. The substrate is heat-treated, and the vacuum deposition method that heats the substrate to 300°C cannot be used, so there is a problem that the selection of manufacturing methods is limited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light scattering reflection substrate?use photosensitive resin composition, light scattering reflection substrate, and production methods therefor
  • Light scattering reflection substrate?use photosensitive resin composition, light scattering reflection substrate, and production methods therefor
  • Light scattering reflection substrate?use photosensitive resin composition, light scattering reflection substrate, and production methods therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] Colloidal silica (PGMEA-silica sol manufactured by Nissan Chemical Industry Co., Ltd.) is used as an inorganic component, and polyvinylphenol-based resist resin (AZ-DX5400P manufactured by Clariant Co., Ltd.) is used as a binder. Form a light-scattering film 3.

[0084] That is, after coating a coating solution obtained by mixing 7.5 g of colloidal silica (30 wt % solution) and 2 g of resist resin solution (solvent) on a glass substrate 2 made of soda lime silicate (thickness: 1 μm), Drying by solvent (heat treatment at 90°C for 30 seconds), exposure (using a photomask at 1000mJ / cm 2 Exposure), sensitization (in order to improve the contrast of the displayed image obtained by the uneven surface of the light scattering film 3, heat treatment at 90° C. for 30 seconds), development (10 seconds with PDA523AD (manufactured by JSR). second development), rinsing (cleaning with a pure water shower), drying, and fixing (heat treatment at 200° C. for 30 minutes) to produce the l...

Embodiment 2

[0088] Using silica powder (eg, Aerosil) as an inorganic component, and using a transparent thermosetting (or light-curing) resin (eg, epoxy resin) as a binder, the light-scattering film 3 is produced by the following method.

[0089] That is, after coating the coating solution obtained by mixing 8.5g Aerosil and 1.5g catalytic curing type single-component epoxy resin on the glass substrate 2, a mold with an ideal concave-convex shape inverted pattern was attached to the coating surface, and the After heating (or lighting from the glass surface) to harden the epoxy resin, the mold is removed and cooled to produce a light-scattering film 3 in which a desired concave-convex shape is transferred. A reflective film 4 made of aluminum was formed on the light-scattering film 3 by a vacuum deposition method to form a light-scattering / reflective substrate 1, and its adhesiveness was measured by the above-mentioned cross-cut peeling test. As shown in Table 1, it has Good adhesion (100 / ...

Embodiment 3

[0091] Using silica powder (eg, Aerosil) as an inorganic component, and using a metal alkoxide (eg, tetraethoxysilane: TEOS) as a binder, the light-scattering film 3 is produced by the following method.

[0092] That is, 6 g of Aerosil and 20.8 g of TEOS were dispersed in a mixed solvent composed of 86 g of ethanol and 7.2 g of pure water, TEOS was hydrolyzed, and the hydrolyzed solution was applied to a glass substrate 2, dried and baked. Step, the light-scattering film 3 is produced. The aluminum reflective film 4 was formed into a film on the light scattering film 3 by vacuum deposition to make a light scattering / reflective substrate 1, and the above-mentioned cross-cut peeling test was used to measure its adhesiveness. As shown in Table 1, it had good Adhesion (100 / 100). Comparative example 1

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
The average particle sizeaaaaaaaaaa
The average particle sizeaaaaaaaaaa
Login to View More

Abstract

A first object of the present invention is to provide a light-scattering / reflecting substrate according to which adhesion between a light-scattering film and a reflecting film can be improved, and durability and chemical resistance can be improved. A light-scattering / reflecting substrate 1 is comprised of a soda lime silicate glass substrate 2, a light-scattering film 3 that has an undulating shape and is formed on the glass substrate 2, and a reflecting film 4 that is formed on the light-scattering film 3 following the undulating shape of the light-scattering film 3. The light-scattering film 3 is formed into the desired undulating shape by applying, onto a surface of the glass substrate 2, a material obtained by adding a photosensitive resin made of an organic material as a binder to an inorganic material such as silicon oxide (silica), aluminum oxide (alumina) or titanium oxide (titania), and then using a photolithography method.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for a light-scattering / reflective substrate, a light-scattering / reflective substrate, and a method for producing the same. In particular, the present invention relates to a photosensitive resin for a light-scattering / reflective substrate suitable for use in liquid crystal displays (LCDs) and the like Composition, light-scattering / reflecting substrate, and method of manufacture thereof. Background technique [0002] Light-scattering / reflecting substrates used in liquid crystal displays (LCDs) and the like so far are light-scattering films made of organic materials in which concavo-convex shapes are formed on the surface of a glass substrate. The light-scattering / reflecting substrate is usually produced by photolithography, in which a photomask is used to illuminate a predetermined part of the acrylic photosensitive resin to cure it, and the uncured part is washed away to form a concave-...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/02G02F1/1335
CPCG02B5/0226G02B5/021G02F2203/03G02F1/133553Y10T428/249921G02B5/0268G02B5/0284G03F7/004
Inventor 椎木哲高岛彻荻野悦男
Owner NIPPON SHEET GLASS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com