Method for melting and forming micro lens array utilizing halftone mask photo etching

A technology of half-tone mask and microlens array, applied in the field of forming microlens array, to achieve the effects of expanding the processing depth range, simplifying the process, and expanding the processing range

Inactive Publication Date: 2005-11-30
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0006] The technical problem of the present invention is: to overcome the shortcomings of the existing microarray optical element forming methods, and to provide a halftone mask photolithography hot-melt microlens forming method that can quickly and effectively produce various microarray optical elements. Method In order to solve the problems encountered in the half-tone masking method, a method for forming micro-optical elements by combining the half-tone masking method with photolithographic hot-melt technology

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  • Method for melting and forming micro lens array utilizing halftone mask photo etching
  • Method for melting and forming micro lens array utilizing halftone mask photo etching
  • Method for melting and forming micro lens array utilizing halftone mask photo etching

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Embodiment 1

[0022] Embodiment 1 is a continuous deep-relief microlens array with an aperture of =1500 μm and an etching depth of h=5 μm manufactured by the method of the present invention. Positive photoresist is used as photoresist material. Its production process is as follows:

[0023] (1) First, design and manufacture a halftone photolithography mask according to the structural parameters and surface shape of the target microlens array, such as figure 1 shown. According to the radius of curvature of the target microlens and the relationship between the expected surface finish of the target microlens and the quantization accuracy of the halftone mask. It is calculated that in order to obtain a microstructure with a surface finish of less than 20 microns, the quantization accuracy of the mask needs to be 10.3 microns, and 10 microns is used in the experiment. And use this size as the quantization unit, convert the undulation of the target micro-relief into the density function of th...

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Abstract

This invention provides a new method for forming a micro-lens array by means of half tone mask and hot melt technique. Comparing with prior art, the method not only reduces greatly the demand of mask machine precision required by micro-structural formation, but also expand greatly processing scope of traditional half tone mask method, can prepare micro-structure with bilge of between several hundred nanometers and a hundred micrometers approximated, caliber of between 100 micrometers and several millimeters.

Description

Technical field [0001] The invention relates to a new method for forming a microlens array by using a half-tone mask combined with hot-melt technology. Background technique [0002] Due to the advantages of light weight, small size, flexible design, and arrayability, microarray optical elements have been widely used in military, scientific research, and civilian fields. The fabrication method of continuous relief microlens array has been a research hotspot all the time. The existing forming methods of microarray optical elements mainly include gray scale mask method, electron beam, laser beam direct writing method, photolithography hot melting method and so on. But these methods all have different degrees of defects. [0003] E-beam and laser beam direct writing methods work similarly. The two systems first focus the electron beam or laser beam to expose the lithographic material point by point, and the relief depth of the point is finally determined by the amount of ener...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B3/00
Inventor 董小春杜春雷邱传凯李淑红赵泽宇
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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