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Method for improving L10-Fept thin film performance with surface activating agent

A surfactant, l10-fept technology, applied in the direction of coating with magnetic layer, cathode sputtering application, sputtering coating, etc., to improve the degree of ordering, fast surface diffusion ability, reduce ordering effect of temperature

Inactive Publication Date: 2006-03-01
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

[0004] The object of the present invention is to provide a surfactant to improve L1 0 - The method of FePt thin film performance, which solves the problem of industrial production of FePt alloy

Method used

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  • Method for improving L10-Fept thin film performance with surface activating agent

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Embodiment Construction

[0011] Thin films were prepared in a magnetron sputtering apparatus. Firstly, the glass substrate is ultrasonically cleaned with organic chemical solvent, deionized water and alcohol, and then placed on the sample base of the sputtering chamber. The substrate was kept at room temperature. Sputtering chamber background vacuum 3×10 -5 Pa, Bi (200 Å) / FePt (200 Å) films were prepared by sequentially depositing bismuth Bi (200 Å) and iron platinum FePt (200 Å) under the condition of sputtering argon gas (purity 99.99%) at a pressure of 0.45 Pa , deposit bismuth Bi (400 Å) and iron platinum FePt (300 Å) to prepare Bi (400 Å) / FePt (300 Å) film. After sputtering, the sample is rapidly vacuumed at a degree of 2×10 -5 Pa heat treatment in vacuum annealing furnace. from figure 1 It can be seen that the FePt film without Bi layer has a higher coercive force (6.8kOe) after annealing at 400°C, while Bi(200) / FePt(200) and Bi(400) / FePt( 300 Å) thin film, the coercivity values ​​reach...

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Abstract

The method for improving LIo-FePt film performance by utilizing surface activating agent is characterized by that in a magnetically-controlled sputter successively depositing Bi and FePt on a cleaned glass baseplate, the background vacuum degree of sputtering chamber is 1X10 to the power-5-7X10 to the power-5Pa, the argon pressure is 0.4-0.6Pa, the baseplate is retained at room temperature, and the background vacuum degree in the course of annealing is 2X10 to the power-5-7X10 to the power-5Pa.

Description

technical field [0001] The invention belongs to the technical field of high-density magnetic recording materials, and in particular provides a method for improving L1 by using a surfactant 0 - Methods of FePt thin film properties. Background technique [0002] In the past ten years, information storage technology, especially magnetic recording technology, has developed rapidly, especially the application of giant magnetoresistive spin valve heads, which has greatly increased the areal recording density of hard disks. At present, the laboratory longitudinal magnetic recording surface density has reached 150Gb / in 2 (S. Mao et al. IEEE Tran. Magn. 40, 307 (2004)). To further increase the recording density, the size of magnetic recording single domain particles must be reduced. When the magnetic recording areal density reaches 1Tb / in 2 At this time, the grain size should be less than 5nm. At this time, due to the need for thermal stability, the magnetic recording material mu...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/851H01F41/18
Inventor 于广华冯春腾蛟李宝河
Owner UNIV OF SCI & TECH BEIJING
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