Liquid crystal display device and producing method thereof
A technology of a liquid crystal display device and a manufacturing method, which is applied in the direction of photolithographic exposure devices, transistors, static indicators, etc., and can solve the problems of damaged flatness of the array substrate 1, reduced productivity, difficulty in maintaining the flatness of the glass substrate, etc., and achieves The effect of short program lead time and high productivity
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Embodiment 1
[0038] First, if figure 1 As shown in (A), chromium, molybdenum, tantalum, aluminum, copper, or alloys or laminates thereof are formed as the first metal film 2 on one surface of the glass substrate 1 using a film forming apparatus such as a sputtering apparatus. Next, a photoresist is coated on one surface of the first metal film 2, and a first photomask is used to form figure 1 (B) Photoresist pattern 3 shown. Then, after etching the first metal film 2 using the photoresist pattern 3 as a mask, the photoresist pattern 3 is removed to form figure 1 (C) Gate film 2A shown.
[0039] Then use a plasma CVD device or a sputtering device such as figure 2 (C) shows covering the first silicon nitride film 4 as the gate insulating layer, the first silicon film 5 as the channel of the transistor, and the second silicon film 6 doped with N-type impurities. In addition, chromium, molybdenum, tantalum, aluminum, copper, or alloys or laminates thereof are coated as the second metal...
Embodiment 2
[0044]As known from Embodiment 1, in the present invention, the pixel electrode does not need to be patterned, and the conductive film for the pixel electrode is physically and electrically separated by using the deep groove 15 formed in the photosensitive acrylic resin film 10. That's it. Therefore, when a high-reflectance metal such as aluminum or aluminum alloy or silver or silver alloy is used as the conductive thin film for the pixel electrode, the pixel electrode (reflective electrode) of a reflective liquid crystal display device can be obtained. These metals are usually coated by sputtering, and their film thickness is equal to that of a transmissive transparent electrode, generally about 0.1 μm. This also includes the meaning of avoiding a decrease in reflectance due to the crystal growth phenomenon accompanying an increase in film thickness.
[0045] However, although not shown in the figure, in order to avoid specular reflection, the substrate of the pixel electrod...
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Abstract
Description
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