Thin film supporting substrate used in filter for hydrogen production and method for manufacturing filter for hydrogen production
A manufacturing method and filter technology, applied in chemical instruments and methods, using solid contact hydrogen separation, membrane technology, etc., can solve the problems of inability to fully exert the durability of the filter, the difficulty of avoiding the deterioration of the adhesive, and the hydrogen permeation efficiency Obstacles and other problems, to achieve the effect of improving hydrogen permeation efficiency, improving hydrogen permeation efficiency, and large hydrogen permeation area
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[0105] [Example 1]
[0106] Manufacture of filters for hydrogen production
[0107] A SUS430 material with a thickness of 50μm was prepared as a base material, and a photosensitive resist material (OFPR manufactured by Tokyo Ohka Kogyo Co., Ltd.) was coated (film thickness 7μm (when dry)) on both sides of the SUS430 material by dipping. Next, a photomask having a plurality of circular openings with an opening size (opening diameter) of 120 μm at a pitch of 200 μm was placed on the resist coating film, and the resist was coated through the photomask. The film is exposed and developed using sodium bicarbonate solution. As a result, a resist pattern with circular openings having an opening size (opening diameter) of 120 μm was formed on both surfaces of the SUS430 material. In addition, the centers of the respective openings of the resist patterns formed on the respective surfaces are uniformly formed by the SUS430 material.
[0108]Then, using the above resist pattern as a mask, the...
Example Embodiment
[0134] [Example 2]
[0135] Manufacture of filters for hydrogen production
[0136] A SUS304 material with a thickness of 50 μm was prepared as a base material, and a photosensitive resist material (OFPR manufactured by Tokyo Ohka Kogyo Co., Ltd.) was coated (film thickness 7 μm (when dry)) on both sides of the SUS304 material by dipping. Next, a photomask having a plurality of circular openings with an opening size (opening diameter) of 120 μm at a pitch of 200 μm was placed on the resist coating film, and the resist was coated through the photomask. The film is exposed and developed using sodium bicarbonate solution. As a result, a resist pattern with circular openings having an opening size (opening diameter) of 120 μm was formed on both surfaces of the SUS304 material. In addition, the center of each opening of the resist pattern formed on each surface is uniformly formed by the SUS304 material.
[0137] Next, using the above-mentioned resist pattern as a mask, the SUS304 mate...
Example Embodiment
[0159] [Example 3]
[0160] Manufacture of filters for hydrogen production
[0161] In the same manner as in Example 2, a plurality of through holes were formed in the SUS304 material to obtain a conductive base material.
[0162] Next, Ni strike plating (thickness: 0.01 μm) was performed on the above-mentioned SUS304 material under the following conditions, and then a resin member (AZ111 manufactured by Sipray Co., Ltd.) was filled in the above-mentioned through hole of the SUS304 material. The filling of these resin parts is carried out by means of grouting. (The above is the filling process)
[0163] (Conditions of Ni strike plating)
[0164] ·Plating bath composition: nickel chloride ...... 300g / L
[0165] Boric acid ...... 30g / L
[0166] ·PH: 2
[0167] ·Liquid temperature: 55~65℃
[0168] ·Current density: 10A / dm 2
[0169] Next, apply the following pretreatment to one surface of the SUS304 material filled with the resin part in the through holes, and then perf...
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