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Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof

A femtosecond laser and micro-nano processing technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of uneven light distribution, energy loss, light intensity difference, etc., and achieve high processing resolution and consistent processing resolution and the effect of machining accuracy

Inactive Publication Date: 2006-11-15
JIANGSU UNIV
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Problems solved by technology

However, there are also the following deficiencies in the preparation process: (1) Since the femtosecond laser beam obeys the Gaussian distribution, the light intensity on the cross section of the beam becomes smaller and smaller along the radial direction, so that the light intensity irradiated on the microlens array The distribution is not uniform, resulting in differences in light intensity on different microlenses, which causes changes in the resolution of the prepared microdevices
(2) There will also be redundant femtosecond laser irradiation in the gap of the microlens array, which will cause a large loss of energy

Method used

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  • Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof
  • Parallel Fs laser double photon photopolymerization micro-nano processing method and apparatus thereof

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[0019] combine figure 1 The device schematic diagram of the parallel femtosecond laser two-photon photopolymerization micro-nano processing of the example is described as follows for the details and implementation of the specific device of the present invention:

[0020] The device for realizing parallel femtosecond laser two-photon photopolymerization micro-nano processing is mainly composed of a laser generation system, an external optical path system and a processing control system. The laser generating system includes a pump light source 1 , a femtosecond laser 2 and a regenerative amplifier 3 . The external optical path system includes a dimming system and a beam focusing system, and the main components include a total reflection mirror 4, an attenuation mirror 5, an optical shutter 6, a fiber coupler 7, an optical fiber array 8, and a microlens array 9, etc. The processing control system includes two parts, namely the micro-nano processing system and the software contro...

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Abstract

The present invention relates to a parallel femtosecond laser two-photon photopolymerization micron nano processing method and its equipment. Said equipment includes the following several portions: pump laser, femtosecond laser, resonant cavity, amplifier, reflecting mirror, attenuator, optical gate, fibre-optic coupler, microlens array, three-dimensional scanning platform and its driven and computer control system. Said invention also provides the concrete steps of its processing method.

Description

technical field [0001] The invention is a micro-nano processing technology, which adopts femtosecond laser two-photon absorption and parallel processing method of micro-lens array, and is suitable for the preparation of three-dimensional micro-nano structures of various photosensitive resin materials. Background technique [0002] With the rapid development of micro-electro-mechanical system applications, people's requirements for micro-processing are not only in the direction of size reduction and precision improvement, but also in the direction of processing diversification. The traditional manufacturing technology for micro-machines can no longer meet the requirements of its further development. [0003] In 1931, Goppert-Mayor proposed the theory of two-photon absorption. It was not until 1992 that the Webb group introduced the two-photon technology into the field of microfabrication. In 1997, Kawata et al. used two-photon absorption technology to produce various three-d...

Claims

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Application Information

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IPC IPC(8): G02F1/35
Inventor 周明杨海峰蔡兰
Owner JIANGSU UNIV
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