Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition

A technology of diamond film and surface chemistry, which is applied in the direction of spinneret assembly, gaseous chemical plating, metal material coating process, etc., to achieve the effect of improving spinnability, ensuring precision and extending service life

Inactive Publication Date: 2007-01-17
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the diamond film prepared by CVD has been quite successful in protecting the surface of cutting tools, there is no research on its application in protecting the surface of tantalum spinnerets.

Method used

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  • Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition
  • Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition
  • Diamond thin-film reinforcement on tantalum spinning head surface by chemical gas phase deposition

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Experimental program
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Effect test

Embodiment 1

[0033] The pretreated tantalum spinneret with a surface roughness of 0.1μm is first carbonized, the carbon source concentration is 12%, the air pressure is 4kpa, the substrate temperature is 960°C, and the carbonization time is 0.5h, and then placed in the CVD chamber. Carry out the diamond film deposition, the carbon source concentration is 1.5%, the air pressure is 4kpa, the substrate temperature is 600°C, the deposition time is 0.5h, and it is taken out after cooling.

[0034] The deposited diamond film ( figure 1 ) The thickness is 3μm, which is not dense enough, the surface roughness of the spinneret is 0.7μm, and the surface hardness is 1100HV. After the spinnability test, the spinning quality is good. After long-term use, the spinneret has no obvious deformation, the surface is slightly corroded, and the diamond film does not fall off.

Embodiment 2

[0036] The pretreated tantalum spinneret with a surface roughness of 0.1μm is directly placed in a CVD chamber without carbonization pretreatment for diamond film deposition. The carbon source concentration is 1.5%, the air pressure is 4kpa, and the substrate temperature is 600°C. The deposition time is 0.5h, and it is taken out after cooling.

[0037] The thickness of the deposited diamond film is 3μm, which is not dense enough, the surface roughness of the spinneret is 0.7μm, and the surface hardness is 1100HV. After spinnability test, the spinning quality is good. After long-term use, the spinneret has no obvious deformation, the surface is slightly corroded, and the diamond film is partially peeled off.

Embodiment 3

[0039] The pretreated tantalum spinneret with a surface roughness of 0.1μm is first carbonized, the carbon source concentration is 12%, the air pressure is 4kpa, the substrate temperature is 960°C, and the carbonization time is 0.5h, and then placed in the CVD chamber. Carry out diamond film deposition, carbon source concentration 3%, pressure 1.5kpa, substrate temperature 750°C, deposition time 0.6h, and take it out after cooling.

[0040] The deposited diamond film ( figure 2 ) The particles have become smaller, with a thickness of 3μm, which is relatively dense, the surface roughness of the spinneret is 0.4μm, and the surface hardness is 1150HV. After the spinnability test, the spinning quality is good. After long-term use, the spinneret has no obvious deformation, the surface is not corroded, and the diamond film does not fall off.

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Abstract

A strengthening process of diamond film on Tantalum spinneret surface prepared by chemical vapor deposition process includes the following steps: a. ultrasonic grinding of the Tantalum spinneret in the alcohol suspension containing diamond fine powder and ultrasonic cleaning of the spinneret surface in acetone and alcohol, as the pretreatment process; b. deposition of the diamond film by CVD process. In the deposition process, the concentration of carbon source is 1-4%, the substrate temperature is 600-900DEG C, the pressure is 0.5 -5kpa and the deposition time is controlled from 0.5 to 2h. This process can be used on the spinneret surfaces of different shapes, increases the hardness and the resistance to alkaline of spinneret surfaces significantly, and controls the local heat stress due to the temperature difference. The spinning quality and service life of the spinneret are also increased by film deposition.

Description

Technical field [0001] The invention relates to a method in the technical field of material surface treatment, in particular to a method for strengthening a diamond film by chemical vapor deposition on the surface of a tantalum spinneret. Background technique [0002] The spinneret is a key component of the chemical fiber textile machine and the basic element of spinning forming. It is covered with thousands of precision horn-shaped micro-holes with a diameter of Φ0.05-0.1mm, and its performance will affect Spinning quality, productivity, cost and many other economic indicators. The spinneret used in the chemical fiber industry has always been made of gold-platinum alloy in the past, and the cost is too high. People try to use relatively inexpensive tantalum instead of gold-platinum alloy to make spinneret. Tantalum is a rare metal with very good mechanical processing, electrical conductivity and acid corrosion resistance. Its disadvantage is that the hardness and alkali corrosio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27D01D4/02
Inventor 姚锦元王裕超
Owner SHANGHAI JIAO TONG UNIV
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