Method of preparing nanometer SiO2 from ophiolite
A serpentine and nanotechnology, applied in the directions of silicon dioxide, silicon oxide, etc., can solve the problems of high production cost, complex process, unfavorable large-scale production of nano-SiO2, etc., and achieve the effect of low production cost and simple process
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Embodiment 1
[0037] Take by weighing the solid residue of a certain amount of 100g, add excessive hydrofluoric acid (excessive 10%), temperature of reaction is controlled at room temperature, the SiF gas that produces is passed in the ethanol aqueous solution (the mol ratio of ethanol and deionized water is 3: 1 ) aged for 4 hours, filtered, washed until the pH of the filtrate was 6, placed the filter cake in an oven, and baked at 150°C for 24 hours to obtain a nano-SiO2 product.
Embodiment 2
[0039] Weigh 100 g of the solid residue, put it into 16% sodium hydroxide solution to reflux, the solid-liquid ratio is controlled at 1:3, the reflux temperature is 80° C., and the reaction time is 1 h. The product after the reaction is sodium silicate, and then hydrochloric acid and surfactant are added to the sodium silicate solution, so that silicic acid can be precipitated, and then dried under ultrasonic conditions to obtain nano-SiO2 products.
Embodiment 3
[0041] Weigh 150g of serpentine ore powder with a fineness of 80 meshes as raw material, reflux with 31% industrial hydrochloric acid for 1 hour to leach the ore powder, the liquid-solid ratio is 4:1, and the reflux temperature is controlled at 95°C. The obtained leaching solution is filtered to carry out solid-liquid separation, and the obtained solid is the solid residue for preparing nano-SiO2.
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