High efficiency deep ultraviolet light-emitting diode
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
- Publication Date
- 2007-02-28
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the technical field of light-emitting diodes, in particular to a MIS (metal-insulator-semiconductor structure) deep ultraviolet (UV) light-emitting diode (LED) structure that utilizes the plasmon effect to improve the quantum efficiency of light emission. Background technique
[0002] Deep ultraviolet (UV) light-emitting diodes (LEDs) are widely used in lighting, high-density optical storage, environmental treatment and detection, biology, and medicine.
[0003] The most mature semiconductor materials used in deep ultraviolet light-emitting diodes are AlGaN (3.4-6.2ev) and AlInGaN (energy band range 0.7-6.2ev) systems, and the ZnMgO (energy band range 3.3-7.8ev) system is still in the development stage. These two materials (AlInGaN and AlGaN are actually a material system, collectively referred to as AlGaN hereinafter) both face the extremely difficult problem of P-type doping. The P-type doping of GaN materials is not easy. W...