Production of high-transmissivity window layer on n/p-shaped GaAs solar battery surface
A technology of solar cells and high transmittance, which is applied in the manufacture of circuits, electrical components, and final products, and can solve problems such as reducing battery performance
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Embodiment 1
[0023] (1): Use gallium arsenide (GaAs) or germanium (Ge) single wafer as the substrate;
[0024] (2): Using metal organic compound vapor deposition (MOCVD) and molecular beam epitaxy (MBE) growth techniques to grow n + / p-type solar cell epitaxial wafer, epitaxial to the emitter layer of the top cell;
[0025] (3): Epitaxial layer of zinc selenium sulfur (ZnSe 0.944 S 0.056 ) material as the window layer, in which the temperature is controlled at 600°C and the pressure is controlled at 300Pa; argon is used as the carrier gas to carry Zn vapor and H 2 Se / H 2 S gas enters the deposition chamber, and the flow rate of the carrier gas is strictly controlled at 0.5L / min.
[0026] (4): Epitaxially highly doped GaAs cap layer on the window layer to complete the preparation of the cell epitaxial wafer;
[0027] (5): AuGeNi / Au positive electrode is evaporated on the epitaxial wafer, and Ti / Au back electrode is made on the highly doped GaAs at the bottom of the epitaxial wafer to ...
Embodiment 2
[0030] The steps of this embodiment 2 are exactly the same as the steps of embodiment 1, the difference is that step (3): epitaxially layer a layer of zinc selenium sulfur (ZnSe 0.944 S 0.056 ) material as the window layer, in which the temperature is controlled at 800°C and the pressure is controlled at 500Pa; argon is used as the carrier gas to carry Zn vapor and H 2 Se / H 2 S gas enters the deposition chamber, and the flow rate of the carrier gas is strictly controlled at 2.5L / min.
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