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Preparing process of nickel hydroxide film in nano structure

A technology of nickel hydroxide and nanostructure, which is applied in the field of nanomaterials to achieve the effects of low cost, simple experimental conditions, and simple and easy preparation process

Active Publication Date: 2007-06-27
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the research on the preparation of nickel hydroxide thin films by the coordination precipitation method has not been reported yet.

Method used

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  • Preparing process of nickel hydroxide film in nano structure
  • Preparing process of nickel hydroxide film in nano structure
  • Preparing process of nickel hydroxide film in nano structure

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0027] In Example 1, the glass slide was used as a substrate, and before being immersed in the reaction solution, it was ultrasonically washed with dilute nitric acid and ethanol for 30 minutes, then rinsed with distilled water, and dried naturally for use. A certain amount of solid NiCl 2 ·6H 2 O was dissolved in 100ml of water to give green NiCl 2 aqueous solution. Wherein, the molar concentration of Ni(II) in the solution is 0.03mol / L. in NiCl 2 Hydrofluoric acid with a mass concentration of 40% was added to the aqueous solution to adjust the atomic ratio of Ni(II) to F in the solution to be 1:3. Then, slowly dropwise add ammonia water with a mass concentration of 25% in the above mixed solution to adjust the pH value of the solution to 8.3. Quickly transfer the configured solution into the reaction container, insert the pre-treated glass slide vertically, and put the reaction container in a water bath at 60°C to stand still. After reacting for 2 hours, take out the g...

example 2

[0029] In Example 2, the glass slide was used as a substrate, and was ultrasonically washed with dilute nitric acid and ethanol for 20 minutes before being immersed in the reaction solution, then rinsed with distilled water, dried naturally, and used. A certain amount of solid NiCl 2 ·6H 2 O was dissolved in 100ml of water to give green NiCl 2 aqueous solution. Wherein, the molar concentration of Ni(II) in the solution is 0.03mol / L. in NiCl 2 Hydrofluoric acid with a mass concentration of 40% was added to the aqueous solution to adjust the atomic ratio of Ni(II) to F in the solution to be 1:3. Then, slowly dropwise add ammonia water with a mass concentration of 25% in the above mixed solution to adjust the pH value of the solution to 8.8. Quickly transfer the configured solution into the reaction container, insert the pre-treated glass slide vertically, and put the reaction container in a water bath at 60°C to stand still. After reacting for 2 hours, take out the glass s...

example 3

[0031] In Example 3, the glass slide was used as a substrate, and was ultrasonically washed with dilute nitric acid and ethanol for 40 minutes before being immersed in the reaction solution, then rinsed with distilled water, dried naturally, and ready for use. A certain amount of solid NiCl 2 ·6H 2 O was dissolved in 100ml of water to give green NiCl 2 aqueous solution. Wherein, the molar concentration of Ni(II) in the solution is 0.03mol / L. in NiCl 2 Hydrofluoric acid with a mass concentration of 40% was added to the aqueous solution to adjust the atomic ratio of Ni(II) to F in the solution to be 1:6. Then, slowly dropwise add ammonia water with a mass concentration of 25% in the above mixed solution to adjust the pH value of the solution to 8.0. Quickly transfer the configured solution into the reaction container, insert the pre-treated glass slide vertically, and put the reaction container into a water bath at 80°C to stand still. After reacting for 2 hours, the glass...

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Abstract

The preparation process of nickel hydroxide film in nanometer structure belongs to the field of nanometer material technology. The preparation process includes: adding hydrochloric acid into nickel salt solution for coordinating nickel ion and fluorine ion to generate [NiFx](x-2)-; adding ammonia water to control solution pH value in 7.5-8.8, inserting the substrate and heating the reactor in water bath at 50-80 deg.c to react for 2-4 hr; taking out the substrate with covered film, ultrasonic washing in water and naturally drying to obtain Ni(OH)2 film in nanometer structure. The process is simple, efficient and fast and easy-to-control reaction conditions, and the obtained hydroxide film in nanometer structure may be used as active electrode material.

Description

technical field [0001] The present invention relates to a kind of nanometer Ni(OH) 2 The invention relates to a method for preparing a thin film, which belongs to the field of nanometer materials. Background technique [0002] Ni(OH) 2 As the positive electrode active material of various alkaline storage batteries (Ni / Cd, Ni / Zn, Ni / MH, Ni / Fe), it plays a key role in the capacity, life and electrochemical performance of the battery. Preparation of Ni(OH) with high capacity and high activity 2 Cathode active materials have become a hot research topic at home and abroad. With ordinary micron spherical Ni(OH) 2 Compared to nano-Ni(OH) 2 It has higher proton migration rate, smaller grain resistance and faster activation speed. Thin film electrode is nano Ni(OH) 2 An important form in nickel series battery applications. Therefore, the preparation of a nanostructured Ni(OH) 2 Thin films are of great significance to the development of nickel series batteries. [0003] The ...

Claims

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Application Information

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IPC IPC(8): C01G53/04C03C17/22
Inventor 聂祚仁李群艳王汝娜韦奇王志宏
Owner BEIJING UNIV OF TECH
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