Integrated optic grating interference micro mechanical acceleration sensor and its producing method

Abstract

The acceleration sensor includes parts: metal grating and electrode setup on surface of the first sheet glass; mass block setup on silicon chip, N pieces of male tab setup on the mass block, and a layer of reflection plane deposited on male tabs; girder or membrane of supporting mass block, and the other end of the mass block connected to the bonding top of table-board formed from silicon chip; the face, where the metal grating and electrode are located, of the first sheet glass is opposite to the reflection plane on mass block, and the position of grating is opposite to the position of silicon island and integrated together through bonding technique; tiny gap is formed between mass block and glass so as to form sensing unit of the sensor; photoelectric detection circuit is connected to electrode of the sensing unit. By using sensibility of light intensity of grating diffracted light spot dependent on distance between grating surface and reflection plane, to implement measuring acceleration.

Description

technical field [0001] The invention belongs to the field of micro-electromechanical systems (MEMS) and sensing technologies, and in particular relates to an integrated grating interference micro-mechanical accelerometer for realizing high-resolution displacement measurement based on integrated grating interference and a manufacturing method thereof. Background technique [0002] In recent years, micromechanical sensors, especially accelerometers, made by MEMS technology have been widely used in military, automotive, aerospace, medical and other fields due to their advantages of small size, low cost, easy integration and mass production. In the fields of microgravity measurement, inclination measurement, aerospace and other fields, since the output signal of the accelerometer is relatively weak, in order to greatly improve the measurement accuracy of the sensor, on the one hand, the test circuit should be continuously improved; improve itself. At present, common detection m...

AI Technical Summary

Problems solved by technology

Since the detection area cannot be too small, otherwise the incident light cannot fully irradiate the detection comb area, but this will increase the size of the entire structure; this test structure has great limitations on the process, and it does not use silicon on insulator (SOI) silicon wafers It is not easy to achieve a smaller comb gap and comb width, and the comb is easily deformed under the action of residual stress, which affects the final detection accuracy; the open-loop measurement is used, so the range is small, and the application range is greatly limited.

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