Hydrogen-containing carbon film
A technology of carbon membrane and hydrogen content, applied in the direction of membrane, membrane technology, semi-permeable membrane separation, etc.
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experiment example 1
[0064] A series of hydrogen-containing carbon films with sample numbers 1-8 were prepared on silicon substrates by any one of cathodic arc ion plating, sputtering and RF plasma CVD.
[0065] The cathodic arc ion plating method (for the hydrogen-containing carbon film with the sample number 1 and 2) is to use solid carbon as a raw material, in an argon atmosphere (for the hydrogen-containing carbon film with a sample number 1) or in argon and The gas phase synthesis was carried out under the gas mixture atmosphere of hydrogen gas (used for the hydrogen-containing carbon film of sample No. 2). The sputtering method (for the hydrogen-containing carbon films of samples No. 3 and 4) was carried out by gas phase synthesis using solid carbon and methane gas as raw materials in a gas mixture of argon gas and methane gas. The RF plasma CVD method (for the hydrogen-containing carbon films of sample numbers 5-8) was carried out by gas-phase synthesis using propane as a raw material. In ...
experiment example 2
[0071] Using cyclohexane as a raw material, seven samples including a hydrogen-containing carbon film disposed on a quartz substrate were prepared by the RF plasma CVD method. The hydrogen-containing carbon film of each sample has a hydrogen content of 55 atomic % and a density of 1.38 g / cm 3 , the compressive stress is 0.21GPa, and the spin density is less than 3×10 16 spin / cm 3 , The thickness is 0.8-1.1μm. Then, under different conditions, any one of UV laser light, SR light and helium ions was used to irradiate the above-prepared hydrogen-containing carbon films to prepare hydrogen-containing carbon films with sample numbers 9-15. The hydrogen content, density, stress, and spin density of the hydrogen-containing carbon films of sample numbers 9-15 were determined. These results are shown in Table II. The first row of the samples in Table II indicates the properties of the hydrogen-containing carbon film before irradiation with UV laser, SR light or helium ions.
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experiment example 3
[0076] Using methane as a raw material, a hydrogen-containing carbon film is formed on the copper wiring of a flexible printed board by RF plasma CVD. The flexible printed board includes a polyimide substrate and copper wiring arranged on the substrate. The resulting hydrogen-containing carbon film had a thickness of 10 μm, a hydrogen content of 53 atomic %, and a density of 1.39 g / cm 3 . The insulating properties of the formed hydrogen-containing carbon film were measured, and it was found that the hydrogen-containing carbon film functions as an insulating protective film for the exposed portion of the copper wiring. A 100,000-fold bending test was performed on a flexible printed board formed with a hydrogen-containing carbon film. As a result, the hydrogen-containing carbon film did not exhibit peeling, and exhibited sufficient durability.
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