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Methods, compositions and devices for performing ionization desorption on silicon derivatives

a technology of ionization desorption and silicon derivatives, applied in the field of silicon substrates, can solve problems such as oxidation of silicon hydride surfaces

Inactive Publication Date: 2006-07-20
WATERS INVESTMENTS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0022] Substrates having a surface as described above are resistant to further oxidation reactions. Thus, such substrates provide consistent results over time and repeated ionization events.
[0031] Substrates having a surface as described above are resistant to further oxidation reactions. Thus, such substrates provide consistent results over time and repeated ionization events. The surfaces can also be derivatized to provide selectivity in adsorption. For example, where the modification of the surface has functions of cationic exchange, basic compounds within the sample applied to the surface may be selectively retained.

Problems solved by technology

These silicon hydride surfaces oxidize over time.

Method used

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  • Methods, compositions and devices for performing ionization desorption on silicon derivatives
  • Methods, compositions and devices for performing ionization desorption on silicon derivatives
  • Methods, compositions and devices for performing ionization desorption on silicon derivatives

Examples

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Effect test

example 1

[0054] The silicon oxide surface of a substrate was reacted with trimethylchlorosilane, and then washed with neat isopropanol. A sample of bovine serum albumin (BSA) digest was applied to the surface and analyzed using a matrix assisted laser desorption ionization mass spectrometer (MALDI-MS) instrument. 500 amol could be detected, at a concentration comparable to that detected by DIOS-MS from a silicon hydride surface. DIOS-MS was performed on the trimethylsilane (TMS)-derivatized surface over the course of several weeks, and no reduction in signal intensity was observed over that time. In contrast, an underivatized DIOS surface shows significant signal deterioration after 2-3 weeks.

example 2

[0055] The silicon oxide surface was reacted with aminiopropyldimethylethoxysilane. This derivatized surface has been found to provide an enhancement in selectivity for certain compounds. For example, sugars such as sucrose and maltotriose cannot be readily detected by DIOS using silicon hydride surfaces, or TMS-derivatized surfaces. However, the amine-derivatized surface provides several orders of magnitude enhancement in signal. This derivatized surface provides selectivity in adsorption. For example, derivatizing a surface with a cation exchanger would selectively bind basic compounds, and would enable easy removal of neutrals and acid interferences. One example demonstrated with TMS-derivatized surfaces is that peptide digests in a solution of 8M urea can be loaded onto a chip, and the peptide will strongly adsorb to the surface. The non-binding urea can then be easily removed prior to mass spec analysis. A fourth benefit of this derivatization technique is that it provides for ...

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Abstract

Embodiments of the present invention are directed to a substrate for performing ionization desorption on porous silicon, methods for performing such ionization desorption and methods of making substrates. One embodiment directed to a substrate for performing ionization desorption on silicon comprises a substrate having a surface having a formula of: As used above, X is H or Y, where at least at least twenty five mole percent of X is Y and Y is hydroxyl, or —O—R1 or O—SiR1,R2,R3 wherein R1,R2, and R3 are selected from the group consisting C1 to C6 straight, cyclic, or branched alkyl, aryl, or alkoxy group, a hydroxyl group, or a siloxane group, and R6 may be a C1 to C36 straight, cyclic, or branched alkyl (e.g., C18, cyanopropyl), aryl, or alkoxy group, where the groups of R6 are unsubstituted or substituted with one or more moieties such as halogen, cyano, amino, diol, nitro, ether, carbonyl, epoxide, sulfonyl, cation exchanger, anion exchanger, carbamate, amide, urea, peptide, protein, carbohydrate, and nucleic acid functionalities. The letter “n” represents an integer from 1 to infinity and any vacant valences are silicon atoms, hydrogen or impurities.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application claims benefit of and is a continuation of International Application No. PCT / US04 / 017853, filed Jun. 4, 2004, Attorney docket number AE-352 and designating the United States, which claims benefit of a priority to U.S. Provisional Application No. 60 / 476,762, filed Jun. 6, 2003, Attorney docket number WAA-352 and U.S. Provisional Application No. 60 / 556,984, filed Mar. 26, 2004, Attorney docket number AE-390, the content of which is expressly incorporated herein by reference in its entirety.STATEMENT ON FEDERALLY SPONSORED RESEARCH [0002] N / A FIELD OF THE INVENTION [0003] Embodiments of the present invention are directed to substrates of silicon used for performing ionization desorption. These substrates are used in laser equipped mass spectroscopy instruments. Substrates of the present invention provide consistent results after repeated use. BACKGROUND OF THE INVENTION [0004] Substrates of porous silicon are used with las...

Claims

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Application Information

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IPC IPC(8): H01J49/00B01L3/00C25B3/13G01N1/00H01J49/16
CPCB01L3/5085B01L3/5088B01L2300/069B01L2300/0819B01L2300/0829B01L2300/12G01N1/22H01J49/0418G01N1/312
Inventor SIUZDAK, GARYGO, EDENSHEN, ZHOUXINCOMPTON, BRUCEBOUVIER, EDOUARD S. P.CREDO, GRACE
Owner WATERS INVESTMENTS
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