Method for manufacturing magnetic recording medium and magnetic recording and reproducing apparatus
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example 1
[0075]A vacuum chamber with a glass substrate for an HD set therein was pre-evacuated to 1.0×10−5 Pa or less. The material for the glass substrate was crystallized glass composed of Li2Si2O5, Al2O3—K2O, MgO—P2O5 or Sb2O3—ZnO. The glass substrate had an outside diameter of 65 mm, an inside diameter of 20 mm and an average surface roughness (Ra) of 2 Å.
[0076]Thin films were sequentially stacked on the glass substrate. Specifically, a soft magnetic layer of FeCoB, an intermediate layer of Ru and a magnetic layer of 70Co-5Cr-15Pt-10SiO2 alloy were first deposited in this order using the DC sputtering, and a protective film layer of C (carbon) was then formed by the P-CVD method. The FeCoB soft magnetic layer had a film thickness of 600 Å. The Ru intermediate layer had a film thickness of 100 Å. The magnetic layer had a film thickness of 150 Å. The C (carbon) protective film layer had an average film thickness of 2 nm.
[0077]A mask layer was formed on the resultant stacked structure by sp...
examples 2 to 28
[0082]Magnetic recording media were manufactured under conditions similar to those in Example 1 except for the material and film thickness of the mask which were changed as shown in Table 1. In Example 28, the resist material was changed from the novolac resin to a thermosetting resin, and the curing treatment was changed from the ultraviolet irradiation to a heat treatment at 150° C. for 30 minutes.
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