Pattern-forming method, and radiation-sensitive resin composition
a resin composition and pattern-forming technology, applied in the field of pattern-forming methods and radiation-sensitive resin compositions, can solve the problems of deterioration of resist films, adversely affecting lithography characteristics, and impairing performance, so as to avoid dissociation from molecular chains
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synthesis example 1
[0194]A solution was prepared by dissolving 19.1 g (50 mol %) of a monomer represented by the following formula (M-1) and 10.9 g (50 mol %) of a monomer represented by formula (M-14) in 60 g of 2-butanone, and further adding 0.32 g of dimethylazobisisobutyronitrile thereto. Next, a 200 mL three-necked flask charged with 30 g of 2-butanone was purged with nitrogen for 30 minutes, and thereafter the reaction vessel was heated to 80° C. with stirring. The monomer solution prepared beforehand was added dropwise using a dropping funnel over 3 hrs. The time when dropwise addition was started was assumed to be a start time point of polymerization and the polymerization reaction was carried out for 6 hours. After completion of the polymerization, the polymerization solution was cooled to no greater than 30° C. by water-cooling and the polymerization solution was charged into 600 g of methanol. The white powder precipitated was filtered off. Thus resultant white powder was washed twice with ...
synthesis examples 2 to 15
[0195]Polymers (A-2) to (A-15) were obtained in a similar manner to Synthesis Example 1 except that the monomers specified in Table 1 were blended in the predetermined amount. In addition, Table 1 collectively presents the Mw, Mw / Mn, and yield (%) of the respective polymers obtained, and the content of the structural units derived from the respective monomers in the respective polymers. It should be noted that the monomers used in the synthesis of the polymer (A), and the monomers used are represented by the following formulae.
[0196]
[0197]
TABLE 1MonomerStructuralStructuralStructuralStructuralOtherunit (I)unit (II)unit (III)unit (IV)structural unitamountamountamountamountamountblendedblendedblendedblendedblended(A)(% by(% by(% by(% by(% byPolymertypemole)typemole)typemole)typemole)typemole)SynthesisA-1M-150——M-1450————Example 1SynthesisA-2M-140——M-1550M-1110——Example 2SynthesisA-3M-240——M-1550M-1110——Example 3SynthesisA-4M-240——M-1545M-12 5——Example 4SynthesisA-5M-350——M-1450————Exam...
synthesis example 16
[0200]A solution was prepared by dissolving 35.8 g (70 mol %) of a monomer represented by the following formula (M-17) and 14.2 g (30 mol %) of a monomer represented by the formula (M-18) in 50 g of 2-butanone, and further adding 5.17 g of dimethyl-2.2′-azobisisobutyrate thereto. Next, a 500 mL three-necked flask charged with 50 g of 2-butanone was purged with nitrogen for 30 minutes, and thereafter the reaction vessel was heated to 80° C. with stirring. The monomer solution prepared beforehand was added dropwise using a dropping funnel over 3 hrs. The time when dropwise addition was started was assumed to be a start time point of polymerization and the polymerization reaction was carried out for 6 hours. After completion of the polymerization, the solution was cooled to no greater than 30° C. by water-cooling and transferred to a 2 l separating funnel, and homogeneously diluted with 150 g of n-hexane, followed by addition of 600 g of methanol and the components were mixed. Then 30 ...
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