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Anti-static resin composition containing fluorinated phosphonium sulfonates

a technology of phosphonium sulfonate and resin composition, which is applied in the field of anti-static resin composition, can solve the problems of affecting the appearance of smooth surfaces, affecting the transparency of articles, and accumulating static charges during processing

Inactive Publication Date: 2004-06-08
SABIC GLOBAL TECH BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

It is, therefore, an object of this invention to provide an anti-static resin composition comprising such polymers as polycarbonate, polyetherimide, polyester, polyphenylene ether / polystyrene blends, polyamides, polyketones, acrylonitrile-butadiene-styrene (ABS) or blends of these polymers or blends thereof with other materials or polymers, and a heat resistant anti-static material with which the aforementioned problems of conventional agents can be eliminated.
It is another object of this invention to provide a new anti-static agent which can be internally added to a synthetic resin preferably having transparent characteristics in the molded state without adversely affecting the transparency and mechanical properties of the molded article. However, this invention is not limited to transparent thermoplastics since anti-static requirements are also applicable to pigmented or translucent molded thermoplastic polymer articles.

Problems solved by technology

As such, this can result in a static charge build-up during processing and use of the polymer.
The charged polymer molded parts can attract dust, which are small particles, and can thus interfere with a smooth surface appearance.
The attracted particles to the surface of a molded article may also cause a decrease in the transparency of the article.
In addition, the electrostatic charge can be a serious obstacle in the production process of such polymers.
These methods employing electrically conductive agents are not generally feasible for many reasons such as the large amount of agents which must be usually used, the difficulty in adding them to the material, the difficulty in obtaining a transparent product or retention of mechanical and rheological properties, if that is the case, and the high cost of such conductive agents.
Thus, these agents can be used only in limited situations.
When used as an internally-applied anti-static agent, however, anionic surfactants are difficult to handle because they are inferior in compatibility and uniform dispersibility and tend to decompose or deteriorate when heated.
Cationic surfactants containing quarternary nitrogen in their molecules and amphoteric surfactants, on the other hand, can be used only in limited situations because they are extremely poor in heat resistance, although their anti-static characteristics are good.
Moreover, because of the limited thermal stability of these non-ionic surfactant anti-static agents, their use with engineering thermoplastic resins, such as aromatic polycarbonates, is also limited due to the temperatures at which such resins are processed.
Thus, these types of surfactants adversely affect the optical properties of aromatic polycarbonates.
Although metal salts of organic sulfonic acids have been reported, especially as internally applied anti-static agents for polycarbonates and polyester resins which are molded at high temperatures, they are not sufficient in compatibility with resins or heat resistance one adverse consequence of insufficient compatibility is that transparency characteristics of certain macromolecular materials such as polycarbonates are lost with such anti-static agents.
There has also been a report of using phosphonium salts or organic sulfonic acids having halogen substituent as a flame retardant (U.S. Pat. No. 4,093,589), but they are not to be expected to serve as anti-static agents as well.
The corresponding cationic surfactants containing quarternary nitrogen in their molecules can only be used in limited situations, because they are extremely poor in heat resistance although their anti-static characteristics are good (U.S. Pat. No. 5,468,973).

Method used

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  • Anti-static resin composition containing fluorinated phosphonium sulfonates
  • Anti-static resin composition containing fluorinated phosphonium sulfonates
  • Anti-static resin composition containing fluorinated phosphonium sulfonates

Examples

Experimental program
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example 1

This Example describes the preparation of a fluorinated phosphonium sulfonate of this invention.

Potassium perfluorobutylsulfonate was used as the starting material. The potassium (K.sup.+ ion) was first exchanged for a H.sup.+ ion using an ion exchange column (Rohm & Haas, Amberjet 1200 H). A second step employed in this procedure was an acid-base reaction using a fluorocarbon tail sulfonic acid and tetra butyl phosphonium hydroxide resulting in a high yield and high purity fluorinated phosphonium sulfonate. The reaction is as follows: ##STR4##

tetrabutylphosphonium nonafluoro-1-butanesulfonate

example 2

This Example describes the preparation of a fluorinated phosphonium sulfonate of this invention.

Potassium nona-fluoro-ethoxyethyl sulfonate was used as the starting material. The potassium (K.sup.+ ion) was first exchanged for a H.sup.+ ion using an ion-exchange column (Rohm & Haas, Amberjet 1200 H). A second step employed in the procedure was an acid-base reaction using a fluorocarbon tail sulfonic acid and tetra butyl phosphonium hydroxide resulting in a high yield and high purity fluorinated phosphonium sulfonate.

The compound obtained had the following formula: ##STR5##

example 3

This example describes the preparation of a fluorinated phosphonium sulfonate of this invention.

Zonyl-TBS (DuPont), which is a mixture of different fluorocarbon containing sulfonic acids and fluorocarbon containing ammonium sulfonates was used as the starting material. The ammonium (NH.sup.+.sub.4 was first exchanged for an H.sup.+ - ion using an ion-exchange column (Rohm & Haas, Amberjet 1200 H). A second step employed in the procedure was an acid base reaction using the mixture of fluorocarbon tail containing sulfonic acids and tetra butyl phosphonium hydroxide. The compound mixture obtained consisted of the following components wherein y is an integer of 1-9. ##STR6##

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Abstract

An anti-static thermoplastic resin composition of 90-99.95 weight % of a thermoplastic resin and correspondingly 10 to 0.05 weight % of a halogenated carbon sulfonic acid salt of a polysubstituted phosphonium compound such as a fluorinated phosphonium sulfonate and wherein the thermoplastic resin is either an aromatic polycarbonate, polyetherimide, polyester, polyphenylene ether, polyphenylene ether / styrene polymer blend, polyamide, polyketone, acrylonitrile-butadiene-styrene, blends thereof and blends thereof with other materials. Preferably the thermoplastic resin is a transparent aromatic polycarbonate.

Description

FIELD OF THE INVENTIONThis invention is related to an anti-static resin composition particularly transparent resins compositions comprising a thermoplastic polymer and a halogenated carbon sulfonic acid salt of a polysubstituted phosphonium compound and to a halogenated carbon sulfonic acid salt of a polysubstituted phosphonium compound.BACKGROUND OF THE INVENTIONMany polymers or blends of polymers are relatively non-conductive. As such, this can result in a static charge build-up during processing and use of the polymer. The charged polymer molded parts can attract dust, which are small particles, and can thus interfere with a smooth surface appearance. The attracted particles to the surface of a molded article may also cause a decrease in the transparency of the article. In addition, the electrostatic charge can be a serious obstacle in the production process of such polymers. In the past, electrically conductive agents such as carbon and metallic particles or surfactants were use...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): C08K5/00C08K5/42C08K5/50
CPCC08K5/50
Inventor WILLEMS, JOHANNES GERARDUS HENRICUSHOEKS, THEODORUS L.
Owner SABIC GLOBAL TECH BV
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