Stepped scanning photoetching machine vibration isolation system analoy experimental apparatus

Abstract

The invention discloses a step-and-scan photoetching machine's isolation system simulation test device; it divides the whole test device into the internal world and the outside world. The outside world mostly complete the simulation of the photoetching machine's precision scanning movements, it lets the workpiece platform and the mask plate have the curve movement according to the schedule speed and acceleration, it completely reappears the true photoetching machine's step-and-scan movement, the internal world is mainly to install the optics system and the workpiece platform and the mask plate, and finishes the last photoetching service. Internal world and the outside world can be joined by the six degrees of freedom precision initiative vibration damper, it depresses the vibration of that the outside world passes to the internal world and this can ensure the internal world's quiet. The invention can let the core part-installation source system's work platform is in the range that the design allows. It improves the silicon's photoetching precision, at the same time; it has precise positioning and synchronous control of step-and-scan photoetching machine's isolation system simulation test device.

Description

technical field [0001] The invention relates to a vibration isolation system simulation test device, in particular to a precision vibration isolation system of a photolithography machine in the field of microelectronics manufacturing technology and a precision positioning technology for a workpiece table and a mask table. The system can be used for stepping In scanning lithography machines and other precision positioning systems. Background technique [0002] Integrated circuit ultra-fine processing technology includes hundreds of processes such as lithography, etching, oxidation, diffusion, doping, sputtering, etc. The process is very complicated and the equipment requirements are extremely high. Among them, the lithography technology for realizing ultra-micro pattern imaging has always been the The core driving force to promote the development of IC technology level, lithography machine is the most important key equipment in integrated circuit equipment, and its investment...

AI Technical Summary

Problems solved by technology

From the perspective of the minimum line width achieved by the lithography machine, it is impossible to achieve such lithography accuracy without a high-precision vibration isolation performance work platform.

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