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Production method for novel gyroscope signal reading graph

A manufacturing method and gyroscope technology, which are applied in the directions of rotating gyroscopes, semiconductor/solid-state device manufacturing, photo-engraving process coating equipment, etc., can solve the problem that the gyroscope signal reading pattern is low in production accuracy and the sides of the line grooves are not steep enough. Straight, rotor surface performance damage and other problems

Inactive Publication Date: 2009-11-11
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the disadvantages of the existing gyroscope signal reading pattern, such as low manufacturing precision, large damage to the surface performance of the rotor, and insufficient steepness of the side of the line groove, etc., and propose a method of adding ion by sputtering coating and ultraviolet lithography. The microfabrication method of beam oblique incident etching greatly improves the signal reading pattern size accuracy and pattern edge profile resolution of the gyroscope detection surface with a uniform multi-groove grating structure, thereby improving the gyroscope measurement accuracy

Method used

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  • Production method for novel gyroscope signal reading graph
  • Production method for novel gyroscope signal reading graph
  • Production method for novel gyroscope signal reading graph

Examples

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Effect test

Embodiment 1

[0036] A metal thin film 102 is sputter deposited on the top plane 101 of the gyro rotor with a film thickness of 1 μm by using a magnetron sputtering coating method. The photoresist for spin-coating on the metal film is Ruihong RJZ-306, and the spin-coating speed is 2000rpm. After the photoresist is spin-coated on the metal film on the top plane of the rotor, the photoresist is pre-baked in an oven at a temperature of 100° C. for 60 seconds. Exposure was performed for 30 seconds by using an ultraviolet lithography machine, and a mercury lamp light source with a wavelength of 435 nm was used as the exposure light source. The photoresist is then post-baked at a temperature of 90° C. for 60 seconds. Then develop with RZX-3038 developer, and soak in the developer at 20°C for 30 seconds. Post-bake the developed photoresist pattern at a temperature of 100° C. for 90 seconds to obtain the desired photoresist pattern 104 on the surface of the metal film. Using the photoresist patt...

Embodiment 2

[0038] A metal thin film 102 is sputter deposited on the top plane 101 of the gyro rotor with a film thickness of 1 μm by using a magnetron sputtering coating method. The photoresist for spin-coating on the metal film is Ruihong RJZ-306, and the spin-coating speed is 2000rpm. After the photoresist was spin-coated on the metal film on the top plane of the rotor, the photoresist was pre-baked in an oven at a temperature of 110° C. for 70 seconds. Exposure was performed for 40 seconds by using an ultraviolet lithography machine, and a mercury lamp light source with a wavelength of 435 nm was used as the exposure light source. The photoresist is then post-baked at a temperature of 100° C. for 70 seconds. Then develop with RZX-3038 developer, and soak in the developer at 22°C for 50 seconds. Post-bake the developed photoresist pattern at a temperature of 110° C. for 100 seconds to obtain the required photoresist pattern 104 on the surface of the metal film. Using the photoresist...

Embodiment 3

[0040] A metal thin film 102 is sputter deposited on the top plane 101 of the gyro rotor with a film thickness of 1 μm by using a magnetron sputtering coating method. The photoresist for spin-coating on the metal film is Ruihong RJZ-306, and the spin-coating speed is 2000rpm. After the photoresist is spin-coated on the metal film on the top plane of the rotor, the photoresist is pre-baked in an oven at a temperature of 120° C. for 90 seconds. Exposure was performed for 90 seconds by using an ultraviolet lithography machine, and a mercury lamp light source with a wavelength of 435 nm was used as the exposure light source. Then the photoresist is post-baked at a temperature of 120° C. for 90 seconds. Then develop with RZX-3038 developer, and soak in the developer at 23°C for 90 seconds. The developed photoresist pattern is post-baked at a temperature of 120° C. for 110 seconds to obtain the desired photoresist pattern 104 on the surface of the metal film. Using the photoresis...

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Abstract

The invention discloses a method for making a novel gyroscope signal reading pattern. The micron-level signal reading pattern is obtained by one sputter coating, one photolithography, and one ion beam etching. The process steps are as follows: 1. Sputter on the top plane of the gyro rotor to obtain a metal film; 2. Spin-coat photoresist on the metal film; 3. Perform ultraviolet exposure and development to obtain a photoresist pattern; 4. Use 15° to 30° The incident angle ion beam is etched and the residual photoresist is removed, and the metal signal reading pattern is obtained on the rotor surface.

Description

technical field [0001] The invention relates to a method for making a novel gyroscope signal reading pattern, in particular to a method for making a high-precision gyroscope signal reading pattern. Background technique [0002] The new gyroscope combines superconductivity and classical mechanics theory, which greatly improves the performance and measurement accuracy of the gyroscope. As a new generation of gyroscope, its appearance and application will make the precision of inertial navigation reach a new height. The rotor of the new gyroscope is a high-precision free rotor without contact with other components, and its measurement can only use non-contact measurement methods. The top plane of the rotor of the new gyroscope is engraved with a pattern of a specific shape. The signal reading system of the gyroscope uses a non-contact photoelectric sensor to read the signal generated by the diffuse reflection of the engraved line on the rotor surface to obtain the attitude inf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01C19/02G01C21/18G03F7/16G03F7/20G03F7/38G03F7/40G03F7/26
Inventor 胡新宁王秋良韩立戴银明黄天斌王晖
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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