Method for making surface plasma micro-nano structure
A technology of surface plasmon and micro-nano structure, which is applied in the direction of nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problems of unrealizable, expensive, and difficult to break through 200 microns in the area of micro-nano structure, and achieve the goal of reducing production costs Effect
Inactive Publication Date: 2010-12-29
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology
Since the surface plasmon micro-nano metal structure requires the line width to be sub-micron or even nano-scale, it has been impossible to achieve it using conventional micro-lithography technology.
At present, surface plasmon micro-nano metal structures are mainly processed by direct writing equipment such as electron beams and ion beams. However, this method not only requires expensive processing equipment, but also makes it difficult to produce micro-nano structures with an area of 200 microns.
Secondly, self-assembly technology can also be used to make nanoscale structures, and the structure area can also be enlarged, but self-assembly technology can only make point arrays, and it is difficult to make line arrays, ring arrays and other non-array micro-nano structures.
This poses a big problem for experimental studies and preliminary applications of surface plasmons requiring large areas, thin linewidths, and arbitrary structures.
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Embodiment 1
[0038] Embodiment one is to make such as by the method of the present invention figure 1 with figure 2 The surface plasmon annular metal structure with diameter φ = 2000 μm and line width h = 10 nm is shown, and 1 in the figure represents the base material. 2 represents the line structure material, and the line structure material in the first embodiment is a molded replication material. Its production process is as follows:
[0039] 1) First select K9 glass 1 as the base material; the corrosion rate of K9 glass is relatively fast, and the material is cheap, and other corrosion materials can also be selected as the base according to needs, such as quartz, silicon, germanium or other types of glass;
[0040] 2) A layer of 100nm masking film metal chromium Cr is deposited on the surface of K9 glass base material 1, and the profile is as attached image 3 As shown, 3 in the figure represents K9 glass, and 4 represents the metal chromium layer;
[0041] 3) Spin-coat photoresis...
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Abstract
The invention supplies a method to make surface plasma microstructure by using wet corrosion method. It includes the following steps: adopting corrosion material as base, coating masking film on the surface of base, coating photoresist on the masking film surface, and making graphics by adopting photo-etching technology; taking corrosion in corrosion liquid; after the base material connecting masking film no longer, stopping corrosion and remove the masking layer and photo-etching layer to gain base template with nanometer line; using the template to make surface plasma microstructure. The method could be widely used in making large area, small line width and random structure.
Description
technical field [0001] The invention relates to a method for forming a plasma lithography template, in particular to a method for manufacturing a localized surface plasmon lithography template by using a wet etching process and further obtaining a surface plasmon micro-nano structure. Background technique [0002] In recent years, with the rapid development of micro-nano processing technology and nanomaterials, the electromagnetic properties of micro-nano metal structures are receiving more and more attention. The interaction of light with surface micro-nano metal structures produces a series of new and exotic physical phenomena. For example, in 1998, French scientist Ebbesen and his collaborators discovered the phenomenon of extraordinary enhancement (Extraordinary Optical Transmission) of light passing through a subwavelength metal hole array. The research of H.J.Lezec et al. further showed that: when the light passes through the sub-wavelength metal nanohole, its transmi...
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IPC IPC(8): B82B3/00
Inventor 董小春杜春雷罗先刚李淑红
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI