Polishing fluid of Nano silicon dioxide grinding material in use for processing microcrystalline glass, and preparation method

Abstract

This invention provides nanoscale SiO2-abrasive polishing solution used for processing glass ceramics. The polishing solution comprises: abrasive I 10-40 wt.%, abrasive II 5-20 wt.%, surfactant 0.01-0.6 wt.%, pH regulator 1-6 wt.%, and deionized water as balance. The pH value of the polishing solution is 10-12. The polishing solution can be used for polishing glass ceramics, and can reduce surface scratches and surface toughness of polished glass ceramics, which can be used for fabricating computer hard disk substrates. The polishing solution has such advantages as high polishing speed, no corrosion to apparatus, and high safety.

Description

technical field [0001] The invention relates to a polishing fluid, in particular to a nano silicon dioxide abrasive polishing fluid for processing glass-ceramics. Background technique [0002] Glass-ceramics is not only a good optical material, but also a good structural material. It has good mechanical and physical properties and chemical stability at relatively high temperatures, so it has attracted widespread attention. [0003] In recent years, with the rapid development of computer technology, the requirements for the storage capacity of computer hard disks have gradually increased. The original aluminum substrate hard disk has been difficult to meet the requirements of this development. Therefore, the industry began to use new materials to prepare computer hard disks. substrate. At present, many practitioners choose glass-ceramics as the material for preparing computer hard disk substrates. Practice has proved that the computer hard disk substrates of glass-ceramics h...

AI Technical Summary

Problems solved by technology

At present, there are problems with the special polishing fluid for polishing the surface of glass-ceramics. First, there are relatively few types. Second, the surface quality after polishing is poor, there are many scratches, and the polishing efficiency is low, which cannot meet the requirements of the rapidly developing computer industry for the surface quality of glass-ceramics. requirements