Method of preparing electron type high-temperature superconductor lanthanum cerium cuprum oxygen film
An electronic and superconductor technology, applied in the usage of superconductor elements, the manufacture/processing of superconductor devices, and the manufacture of cables/conductors, etc., can solve the problems of expensive equipment, slow film deposition rate, etc. low cost effect
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Embodiment 1
[0039] Concrete preparation steps are as follows:
[0040] 1. According to La 2-x Ce x CuO 4 , where the doping ratio of x=0.11 is adopted, the LCCO ceramic target is made by the solid-state reaction method, and installed on the target base of the reaction chamber;
[0041] In this example, the specific steps for preparing LCCO ceramic targets by solid-state reaction method are as follows:
[0042] a. Ingredients: Calculate the chemical ratio of the target according to x=0.10, weigh a certain amount of high-purity (>99.9%) La2O3, CeO2 and CuO powders, fill them in an agate mortar and grind them evenly;
[0043] b. Pre-calcination: first pre-calcine the mixture at 800-900°C for 12-24 hours, so that various raw materials can undergo preliminary synthesis reactions. Then cool down and take out to grind evenly. Sinter the pre-fired powder at a high temperature of 950°C for more than 48 hours to make it undergo a sufficient chemical phase formation reaction. This is accompani...
Embodiment 2
[0057] In this embodiment, the substrate is MgO; the target material is under-doped, and its ratio is x=0.08; the growth temperature is 600°C, and the pressure ratio of the mixed gas in the reaction chamber is oxygen:argon=1 / 4, The pressure in the reaction chamber is 40Pa, the sputtering current during growth is 300mA, the sputtering time is 30, the annealing temperature is 500°C, and the annealing time is 60 minutes. Other steps and parameters are the same as in Example 1. The LCCO thin film sample prepared in this example has The superconducting transition temperature is 5.0K, and the surface morphology of the sample is as follows figure 2 As shown, it can be seen from the figure that the surface of the LCCO film grown by the method of the present invention is very smooth, and the average surface roughness is about 2 nanometers.
Embodiment 3
[0059] In this embodiment, the substrate is selected from LaAlO 3 , the target material is over-doped, the proportion is x=0.16, the growth temperature is 800°C, the pressure ratio of the mixed gas in the reaction chamber is oxygen:argon=1 / 4, the reaction chamber pressure is 50Pa, the growth The sputtering current is 300mA, the sputtering time is 80 minutes, the annealing temperature is 650°C, and the annealing time is 40 minutes. Other steps and parameters are the same as in Example 1. The superconducting transition temperature of the LCCO film sample prepared in this example is 12.0K
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