5 results about "Cation composition" patented technology

To provide a resist composition that can achieve high sensitivity and reduce roughness. [Solution] A resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, the resist composition containing a compound comprising a cation (C0) represented by the following general formula (c0). In the formula, R 1 is a hydrocarbon group which may have substituents, X is a halogen atom, and R 2 is a hydrocarbon group which may have substituents, and Ar 1 and Ar 2 Each of these is an aryl group which may have substituents, and n is an integer between 0 and 3. TIFF2026101072000129.tif49170

The present invention adopts a resist composition which generates acid when exposed to light and the solubility of which in a developing solution is changed by the action of the acid. The resist composition contains a compound containing a cation represented by general formula (c0). In the formula, R01 and R02 each independently represent an aryl group that may have a substituent, an alkyl group that may have a substituent, or an alkenyl group that may have a substituent. R01 and R02 may be bonded to each other to form a ring together with a sulfur atom in the formula. R03 represents a substituent. k is an integer from 0 to 3. According to this resist composition, higher sensitivity can be achieved, lithography characteristics such as roughness reduction can be enhanced, and the occurrence of defects can be suppressed.

The objective is to provide a lubricating oil composition that has low volatility and excellent anti-foaming properties under reduced pressure. [Solution] The present invention relates to a lubricating oil composition comprising an ionic liquid (X) consisting of an anion (A) and a cation (B), wherein the anion (A) is at least one anion selected from the group consisting of alkyl carboxylate anions, alkyl sulfonate anions, dialkyl phosphate anions, dicyanamide anions, and thiocyanate anions, the water content in the lubricating oil composition is 50 ppm or less, and the viscosity of the lubricating oil composition at 25°C is 15 to 370 mPa·s.

The present invention provides a resist composition, a resist pattern formation method, a compound used in the resist composition, an acid generator, an acid diffusion control agent, and a polymer compound that achieve high sensitivity, enhance lithography characteristics such as roughness reduction, and suppress the occurrence of defects. [Solution] A resist composition is used that generates acid upon exposure and whose solubility in a developer solution changes due to the action of the acid, and which contains a compound comprising a cation represented by the general formula (c0). In the formula, R 01 and R 02 Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. 01 and R 02 These may bond with each other to form a ring together with the sulfur atom in the formula. 03 represents a substituent. TIFF2026110235000171.tif46170

The application belongs to the technical field of glass and specifically relates to a glass material with high corrosion resistance and stability, the cation composition of which is as follows in terms of mole percentage: 61-70% of Si 4+ , 3-12.5% of B 3+ , 1-5.5% of Al 3+ , 5-13% of K + , 5-13% of Na + , 0.2-3% of Ca 2+ , 0.1-2% of Li + , 0.1-1% of Mg 2+ , and 0.1-1% of Ti 4+ . The application is designed in a multi-component and multi-functional synergistic manner, so that the prepared glass meets the harsh requirements on thermal, optical, chemical and processing properties, is suitable for high-end optical devices such as micro-channel plates, and has a wide application prospect in the fields of photoelectric detection and imaging, mass spectrometers, high-energy physics, streak cameras, high-end medical imaging and the like.