25 results about "Cation composition" patented technology

The present invention relates to the field of material technology, and more specifically, to an onium salt compound, a photoacid generator, a photoresist composition, and a pattern forming method. The onium salt compound is a salt composed of anions and cations, wherein the cations are sulfonium cations or iodonium cations; the anion general formula is as shown in formula (B): In formula (B), R1 is an ester-containing group that can react with TMAH developer, R2 is a substituted or unsubstituted cycloalkane group with a carbon number of 6 to 10, and n is any integer between 1 and 3. ‑ The combination of fluorine atoms with high electron-withdrawing properties at relatively close positions can enhance the acidity, while introducing a cyclic hydrocarbon group with large spatial volume to reduce the diffusion of the acid; in addition, the addition of a group fragment with an ester group that can be cleaved by an alkaline developer can effectively reduce the development defects. The onium salt compound provided by the present invention is used as a photoacid generator to meet the current demand for high-resolution resist patterns, including low line width roughness (LWR) of the pattern and a smaller mask error enhancement factor (MEEF) of the line pattern, as well as fewer development defects.

To provide a resist composition that can achieve high sensitivity and reduce roughness. [Solution] A resist composition that generates acid upon exposure and whose solubility in a developer changes due to the action of the acid, the resist composition containing a compound comprising a cation (C0) represented by the following general formula (c0). In the formula, R 1 is a hydrocarbon group which may have substituents, X is a halogen atom, and R 2 is a hydrocarbon group which may have substituents, and Ar 1 and Ar 2 Each of these is an aryl group which may have substituents, and n is an integer between 0 and 3. TIFF2026101072000129.tif49170

An onium salt monomer consists of an anion having an aromatic ring substituted with a polymerizable group and iodine, a substituent containing a fluorosulfonic acid anion structure and a substituent containing an iodized aromatic ring being appended to the aromatic ring, and a cation. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern having satisfactory lithography properties such as LWR and CDU as well as etch resistance.

The present invention provides a corrosion-preventive coating composition that allows each step in the corrosion prevention process to be carried out in fewer steps, reduces the risk of re-corrosion, and, when applied to a corroded structure, restores the surface to its pre-corrosion state. [Solution] A corrosion-resistant coating film is used, formed from a corrosion-resistant coating composition (Y) which contains an ionic liquid (X) consisting of a thiocyanate anion and a cation (B) and has a pH of 5 to 9 at 25°C, preferably having a halogen content of 20 ppm or less.

The present invention adopts a resist composition which generates acid when exposed to light and the solubility of which in a developing solution is changed by the action of the acid. The resist composition contains a compound containing a cation represented by general formula (c0). In the formula, R01 and R02 each independently represent an aryl group that may have a substituent, an alkyl group that may have a substituent, or an alkenyl group that may have a substituent. R01 and R02 may be bonded to each other to form a ring together with a sulfur atom in the formula. R03 represents a substituent. k is an integer from 0 to 3. According to this resist composition, higher sensitivity can be achieved, lithography characteristics such as roughness reduction can be enhanced, and the occurrence of defects can be suppressed.

This radiation-sensitive composition comprises: a compound represented by formula (1) and a radiation-sensitive acid-generating body formed from a radiation-sensitive cation and an organic anion having a steroid skeleton or a 9,10-ethanoanthracene skeleton. In formula (1), R11, R12, and R13 are each independently, a C1-20 monovalent aliphatic hydrocarbon group.

The invention discloses a sulfonium sulfonate photoacid generator containing a carborane structure and application of the sulfonium sulfonate photoacid generator, and particularly provides a compound which is composed of anions and cations, the structure of the anions is shown as a formula (I) or a formula (II), and the structure of the cations is shown as a formula (I) or a formula (II). The photoacid generator provided by the invention is novel in structure, high in exposure energy and good in application prospect.

The objective is to provide a lubricating oil composition that has low volatility and excellent anti-foaming properties under reduced pressure. [Solution] The present invention relates to a lubricating oil composition comprising an ionic liquid (X) consisting of an anion (A) and a cation (B), wherein the anion (A) is at least one anion selected from the group consisting of alkyl carboxylate anions, alkyl sulfonate anions, dialkyl phosphate anions, dicyanamide anions, and thiocyanate anions, the water content in the lubricating oil composition is 50 ppm or less, and the viscosity of the lubricating oil composition at 25°C is 15 to 370 mPa·s.

The present invention provides a resist composition, a resist pattern formation method, a compound used in the resist composition, an acid generator, an acid diffusion control agent, and a polymer compound that achieve high sensitivity, enhance lithography characteristics such as roughness reduction, and suppress the occurrence of defects. [Solution] A resist composition is used that generates acid upon exposure and whose solubility in a developer solution changes due to the action of the acid, and which contains a compound comprising a cation represented by the general formula (c0). In the formula, R 01 and R 02 Each of these independently represents an optionally substituted aryl group, an optionally substituted alkyl group, or an optionally substituted alkenyl group. 01 and R 02 These may bond with each other to form a ring together with the sulfur atom in the formula. 03 represents a substituent. TIFF2026110235000171.tif46170

To provide an onium salt used as a photoacid generator contained in a chemical amplification resist composition excellent in lithography performance, a photoacid generator comprising the onium salt, and a resist composition.SOLUTION: An onium salt comprising an anion represented by the following general formula (1A) and a cation represented by the following general formula (1B): SELECTED DRAWING: None

To provide means for improving a ratio of a polishing speed of SiOC to a polishing speed of SiN. There is provided a polishing composition containing: abrasive grains containing at least one kind of zirconia particles; a selection ratio improver containing at least one kind of a salt composed of a monovalent anion and a monovalent or higher valent cation and improving a ratio of a polishing speed of SiOC to a polishing speed of SiN; and a pH adjusting agent containing at least one kind of an acid, in which a pH is more than 3.0 and less than 7.0, and a zeta potential of the abrasive grain is a positive value.

An onium salt consisting of an aromatic carboxylic acid anion including a partial structure having iodine and a cyclic ether structure and an onium cation is provided. When processed by photolithography using high-energy radiation, a chemically amplified resist composition comprising the onium salt has advantages including high sensitivity, high resolution, improved lithography properties, and collapse resistance.

The application belongs to the technical field of glass and specifically relates to a glass material with high corrosion resistance and stability, the cation composition of which is as follows in terms of mole percentage: 61-70% of Si 4+ , 3-12.5% of B 3+ , 1-5.5% of Al 3+ , 5-13% of K + , 5-13% of Na + , 0.2-3% of Ca 2+ , 0.1-2% of Li + , 0.1-1% of Mg 2+ , and 0.1-1% of Ti 4+ . The application is designed in a multi-component and multi-functional synergistic manner, so that the prepared glass meets the harsh requirements on thermal, optical, chemical and processing properties, is suitable for high-end optical devices such as micro-channel plates, and has a wide application prospect in the fields of photoelectric detection and imaging, mass spectrometers, high-energy physics, streak cameras, high-end medical imaging and the like.

The application discloses a high-entropy perovskite material, a perovskite device and a method for improving stability of a three-dimensional perovskite, and belongs to the technical field of perovskite photoelectric materials. i1 )2(A j ) n‑1 B n X 3n+1 or (A i2 )(A j ) n‑ 1B n X 3n+1 ; in the formula, n is a positive integer, when n=1, A i1 is composed of at least four organic cations M i1 , A i2 is composed of at least four organic cations M i2 ; when n>1, A i1 is composed of at least three organic cations M i1 , A i2 is composed of at least three organic cations M i2 ; due to the increase of system entropy, the high-entropy perovskite material has more superior stability compared with a two-dimensional perovskite with a single A-site cation, and the high-entropy perovskite material can be applied to a perovskite device, so that the problem of long-term stability of the device can be solved.

An onium salt monomer consists of a sulfonic acid anion containing a polymerizable group and being free of iodine and a triarylsulfonium cation containing iodine and fluorine. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern with satisfactory exposure latitude, edge roughness, dimension uniformity and depth of focus when processed by photolithography using high-energy radiation, as well as collapse resistance.

To provide an onium salt used for a chemically amplified resist composition excellent in lithography performance, a photoacid generator comprising the onium salt, and a chemically amplified resist composition.SOLUTION: An onium salt comprising an anion represented by the following general formula (1A) and a cation represented by the following general formula (1B): SELECTED DRAWING: None

A halospinel-based solid electrolyte for an all-solid-state battery has the following composition: LiaM1bM2cScyX4, wherein X is one or more halogen; M1 is a divalent cation selected from the group consisting of Mg, Ca, Sr and Zn; M2 is one of a divalent, trivalent or tetravalent cation; 1.75≤a≤2.75; 0≤y≤0.375; 0.125≤b≤0.5; and 0.125≤c≤0.5.

A radiation-sensitive composition according to the present invention contains: a polymer (A) that has an acid-dissociable group; and an onium salt (Q) that comprises a carboxylic acid anion and an onium cation. The carboxylic acid anion has a (thio)acetal structure, and the onium cation is an iodonium cation or a quaternary ammonium cation or is a sulfonium cation that includes an aromatic ring and a functional group that is bonded to the aromatic ring, the functional group being at least one of a fluoro group (excluding a fluoro group of a fluoroalkyl group), an iodo group, and a fluoroalkyl group.

Provided is a glass having excellent transmission characteristics in the visible light region, excellent absorption characteristics in the near-infrared region, and excellent weather resistance. The cation components of the glass comprise: 62-75% of P < 5 + >; 1-10% of Al < 3 + >; cu < 2 + >: 4-16%; na < + >: 4-16%; 0.5 to 10 percent of Ba < 2 + >; 0-5% of Zn < 2 + >; wherein P < 5 + > / (Al < 3 + > + Zn < 2 + >) is 6.5-30.0. Through reasonable component design, the obtained glass has an excellent transmission characteristic in a visible light region, has an excellent absorption characteristic in a near-infrared region, and has excellent weather resistance.

The present invention provides a glass having excellent transmission properties in the visible region, excellent absorption properties in the near infrared region, and excellent weather resistance. The glass has a cation composition comprising: P 5+ : 62 to 75%; Al 3+ : 1 to 10%; Cu 2+ : 4 to 16%; Na + : 4 to 16%; Ba 2+ : 0.5 to 10%; Zn 2+ : 0 to 5%; wherein P 5+ / (Al 3+ + Zn 2+ ) is 6.5 to 30.0. Through rational component design, the glass obtained by the present invention has excellent transmission properties in the visible region, excellent absorption properties in the near infrared region, and excellent weather resistance.

An onium salt monomer consists of a fluorosulfonic acid anion containing an aromatic ring structure substituted with a polymerizable group and iodine and a triarylsulfonium cation containing iodine and fluorine. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern with satisfactory exposure latitude, edge roughness, dimension uniformity and depth of focus when processed by photolithography using high-energy radiation, as well as collapse resistance and etch resistance.

The invention discloses a preparation method of a photocatalyst ZnxNi (1-x) Fe2O4 (at) BiOBr based on a semiconductor heterojunction and application of the photocatalyst ZnxNi (1-x) Fe2O4 (at) BiOBr in peroxymonosulfate (PMS) activation, and the photocatalyst ZnxNi (1-x) Fe2O4 (at) BiOBr is used for efficiently degrading organic pollutants in water, especially acetaminophen (PAM). The heterojunction photocatalyst is synthesized through a two-step hydrothermal method, and the cation composition, the microstructure and the heterojunction proportion of the heterojunction photocatalyst can be adjusted. The influence of different compositions and conditions on the PAM degradation effect is studied in detail, and the ratio of ZnxNi1-xFe2O4 to BiOBr is optimized, so that the optimal catalytic degradation effect is achieved. Under the optimal condition, the Zn0. 8Ni0. 2Fe2O4 (at) BiOBr photocatalyst can be used for completely removing PAM (Polyacrylamide) within 100 minutes, and the removal rate of 64% is also shown under the dark condition. In addition, the catalyst has good reusability, and still keeps efficient performance after five times of continuous treatment. According to the invention, a new understanding is provided for photo-assisted PMS activation in water environment pollution treatment, and an efficient and recyclable heterogeneous catalyst is provided for degradation of organic pollutants in water.

A halospinel-based solid electrolyte for an all-solid-state battery has the following composition: LiaM1bM2cScyX4, wherein X is one or more halogen; M1 is a divalent cation selected from the group consisting of Mg, Ca, Sr and Zn; M2 is one of a divalent, trivalent or tetravalent cation; 1.75 ≤ a ≤ 2.75; 0 ≤ y ≤ 0.375; 0.125 ≤ b ≤ 0.5; and 0.125 ≤ c ≤ 0.5.

The disclosure relates to an electrochemical structure composed of a first electrode (A1), a second electrode (C2), an electrolyte (E4) and an anionic transport layer (CTA) in which the anionic transport layer (CTA) is never in direct contact with the electrodes A1 and C2 at the same time, and the electrolyte E4 is an inorganic material solid at room temperature and composed of anions and cations.

A resist composition comprising a base polymer comprising repeat units consisting of an iodized carboxylic acid anion bonded to the backbone and an organic cation and repeat units consisting of an iodized sulfonic acid anion bonded to the backbone and a sulfonium cation has a high sensitivity and resolution. A pattern of satisfactory profile with reduced LWR and improved CDU is formed therefrom.