Real time measuring weight increase speed controlling chemical gas-phase deposition device and method

A technology of chemical vapor deposition and real-time measurement, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of increasing production cost, reducing production efficiency, waste economy, etc., to save time and avoid products Oxidation, efficiency improvement effect

Inactive Publication Date: 2008-08-06
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it takes 10-24 hours for chemical vapor deposition to drop from high temperature to room temperature. In the long-term preparation process, not only the deposition and infiltration time are wasted, but also the labor intensity of workers is increased, the production efficiency is reduced, and the production cost is increased.
In addition, once the process changes, or gas leakage o

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] The small chemical vapor deposition furnace is placed on an electronic ground balance, and the surface of the electronic ground balance is flush with the floor of the laboratory room. The cooling water pipe of the furnace body is made of plastic water pipe; the inlet pipe of the furnace body is made of plastic pipe, which is required not to be deformed under vacuum; the outlet pipe of the furnace body is made of stainless steel hose; the power supply is connected by movable wiring. Connect the electronic ground balance with the industrial computer through the data line. Weigh the initial weight of the furnace body under the conditions of feeding cooling water and reaction gas. Put a number of three-dimensional four-way braided carbon fiber rocket engine nozzles into the deposition furnace for silicon carbide infiltration, pre-weigh the weight of the carbon fiber prefabricated body as the net weight, and monitor the weight gain rate through the industrial computer. When ...

Embodiment 2

[0019] The medium-sized chemical vapor deposition furnace is placed on two electronic ground balances. The surfaces of the two electronic ground balances are kept at the same level, and the weights are basically the same. The cooling water pipe of the furnace body is made of plastic water pipe; the inlet pipe of the furnace body is made of plastic pipe, which is required not to be deformed under vacuum; the outlet pipe of the furnace body is made of stainless steel hose; the power supply is connected by movable wiring. The electronic ground balance is connected to the industrial computer through a data cable, and the program in the industrial computer is corrected, and the weight displayed on the display is the sum of the loads of the two electronic ground balances. Weigh the initial weight of the furnace body under the conditions of feeding cooling water and reaction gas. Under the condition of feeding reaction gas, circulating water and normal working conditions, place a sta...

Embodiment 3

[0021]The large-scale chemical vapor deposition furnace is placed on four electronic ground balances. The surfaces of the four electronic ground balances are kept at the same level. Four supports are evenly distributed under the furnace body. The electronic ground balance bears the same weight basically. The cooling water pipe of the furnace body is made of plastic water pipe; the inlet pipe of the furnace body is made of plastic pipe, which is required not to be deformed under vacuum; the outlet pipe of the furnace body is made of stainless steel hose; the power supply is connected by movable wiring. The electronic ground balance is connected to the industrial computer through the data line, and the program in the industrial computer is corrected, and the weight displayed on the display is the sum of the loads of the four electronic ground balances. Weigh the initial weight of the furnace body under the conditions of feeding cooling water and reaction gas. Under the conditio...

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PUM

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Abstract

The invention relates to a chemical vapor deposition device and a method, and in particular relates to the chemical vapor deposition device which can measure and control the weight gain rate and the weight gain speed rate of porous carbon prefabricated parts in time and the method. The device and the method are suitable for checking the weight gain rate and the weight gain speed rate of carbon/carbon composite material or carbon/ silicon carbide composite material in the chemical vapor deposition process and can control the deposition and permeation process. The device and the method are characterized in that the device comprises a system which is composed of a set of chemical vapor deposition furnaces, a set of electronic weighing bridges and a set of industrial computers. The device and the method have the advantages that: firstly, the weight gain rate and the weight gain speed rate can be measured in time, secondly, the device can automatically recognize whether deposition is finished or not, thirdly, the time is saved and the efficiency is increased, fourthly, the process parametersof the chemical vapor deposition can be optimized, fifthly, chemical reaction characteristics which are happened in the deposition process can be automatically recognized and judged according to changes of the sedimentation rate, and procedures of water supply, gas supply, power supply, temperature raising and lowering and the like are correspondingly regulated to reach intelligent control.

Description

technical field [0001] The present invention relates to a chemical vapor deposition device and method, in particular to a chemical vapor deposition device capable of measuring and controlling the weight gain rate of a porous carbon prefabricated body in real time, which is suitable for carbon / carbon composite materials or carbon / silicon carbide composite materials in the The detection of weight gain rate and weight gain rate of chemical vapor deposition or infiltration process, and can control the deposition or infiltration process. Background technique [0002] Chemical vapor deposition and chemical vapor infiltration are techniques used in the semiconductor and aerospace industries to deposit a wide variety of materials, including metallic, non-metallic, and composite materials. Carbon / silicon carbide ceramic matrix composites have low density, good oxidation resistance, corrosion resistance, outstanding mechanical properties and thermophysical properties, and are widely u...

Claims

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Application Information

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IPC IPC(8): C23C16/52C23C16/26
Inventor 陈照峰方聃王亮兵张颖承涵万水城吴王平严波李聪
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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