Viewing glass for radio frequency electromagnetic screen and method for preparing same
A technology of window glass and electromagnetic waves, applied in the direction of magnetic/electric field shielding, shielding, electrical components, etc., to achieve good permeability, high transmittance, and effective shielding effects
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Embodiment 1
[0022] 1) Use 3mm white glass as the coating substrate, first soak and clean it with a special glass cleaning solution, then place it in an acetone solution for ultrasonic vibration cleaning, then rinse it with deionized water, and finally dry it with clean hot air, put it into the electron beam evaporation studio, at 10 -5 Under Pa background vacuum, Ar gas was introduced, and the substrate surface was cleaned again by ion bombardment. The ion bombardment voltage was 1.4kV, the bombardment current was 90mA, and the bombardment time was 16min.
[0023] 2) Heating the substrate temperature to 300°C, filling it with pure oxygen, and evaporating the ITO metal oxide film by electron beam evaporation, controlling the vacuum degree of the studio to 4.8×10 -2 Pa, beam current 10mA, oxygen flow rate 75ml / min, deposition rate 0.7 angstroms / second.
[0024] 3) Turn off the oxygen and heating device in the working room. After cooling to room temperature, use electron beam evaporation to...
Embodiment 2
[0028] 1) Use 3mm white glass as the coating substrate, first soak and clean it with a special glass cleaning solution, then place it in an acetone solution for ultrasonic vibration cleaning, then rinse it with deionized water, and finally dry it with clean hot air, put it into the electron beam evaporation studio, at 10 -5 Under Pa background vacuum, Ar gas was introduced, and the substrate surface was cleaned again by ion bombardment. The ion bombardment voltage was 2.0kV, the bombardment current was 120mA, and the bombardment time was 12min.
[0029] 2) Heating the substrate temperature to 330°C, filling with pure oxygen, and evaporating ITO metal oxide film by electron beam evaporation, controlling the vacuum degree of the studio to 5.0×10 -2 Pa, beam current 30mA, oxygen flow rate 90ml / min, deposition rate 2.0 angstroms / second.
[0030] 3) Turn off the oxygen and heating device in the working room. After cooling to room temperature, use electron beam evaporation to evapo...
Embodiment 3
[0034] 1) Use 3mm white glass as the coating substrate, first soak and clean it with a special glass cleaning solution, then place it in an acetone solution for ultrasonic vibration cleaning, then rinse it with deionized water, and finally dry it with clean hot air, put it into the electron beam evaporation studio, at 10 -5 Under Pa background vacuum, Ar gas was introduced, and the substrate surface was cleaned again by ion bombardment. The ion bombardment voltage was 2.5kV, the bombardment current was 180mA, and the bombardment time was 10min.
[0035] 2) Heating the substrate temperature to 350°C, filling with pure oxygen, and evaporating ITO metal oxide film by electron beam evaporation, controlling the vacuum degree of the studio to 5.2×10 -2 Pa, beam current 50mA, oxygen flow rate 100ml / min, deposition rate 2.5 angstroms / second.
[0036] 3) Turn off the oxygen and heating device in the working room. After cooling to room temperature, use electron beam evaporation to evap...
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