The invention relates to an etching method for OGS (One Glass Solution) glass subjected to secondary chemical enhancement, and the etching method comprises the following steps of: etching an OGS glass sheet in an etching bath for 6-15 minute, wherein an acid-resisting film is respectively adhered to the forward surface and back surface of the OGS glass sheet, the etching bath is filled with etching acid liquor, and the temperature of the etching bath is 30-35 DEG C, the etching acid liquor is prepared by mixing a hydrofluoric acid solution, auxiliary acid liquor and water at a volume ratio of (4-5):(1.5-2.5):(3-4), the auxiliary acid liquor is a mixture of one or more of a salpeter solution, a sulfuric acid solution or a hydrochloric acid solution, the mass concentration of the hydrofluoric acid solution is 40%, the mass concentration of the salpeter solution is 68%, the mass concentration of the sulfuric acid solution is 86%, and the mass concentration of the hydrochloric acid solution is 31%; bubbling the etching acid liquor in an etching process, wherein the bubbling amount is 50-150 l/min. According to the invention, the occurrence of irregular edge and sawteeth phenomena caused by the poor etching of OGS glass can be avoided, the glass strength is improved, and the problem of bad appearance caused by edge BM falling off and corrosion of an ITO circuit is avoided; micro cracks at the edges of glass can be effectively eliminated, so that the mechanical compressive resistance amplitude can be enhanced, and the strength and yield of the OGS glass can be significantly enhanced.