SnO2 thin film of vehicle mounted ethanol detection and preparation method thereof
A thin film and ethanol technology, applied in the field of SnO2 thin film for vehicle-mounted ethanol detection and its preparation, can solve the problems of small particle size of tin oxide, unfavorable large-scale production, unfavorable preparation method, etc., and achieves easy operation, good surface morphology, process simple effect
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[0038] SnO for in-vehicle ethanol detection 2 The preparation method of the film includes electrode preparation, electrode pretreatment, film preparation, doping and annealing in the implementation, including:
[0039] Electrode preparation: the comb-shaped electrode layer 2 is prepared on the silicon substrate 1 using techniques such as micromachining and photolithography;
[0040] Electrode pretreatment: First, carry out the electrode lead, and weld the gold wire with gold paste on both ends of the electrode. Then a layer of 10-20nm carbon film is vaporized on the surface by sputtering to enhance the conductivity of the electrode;
[0041] Thin film preparation: LK2005 electrochemical workstation is used, and the constant current technology is used to control the current electrolysis coulometric method for electrodeposition. Electrodeposition conditions: I=0.00016At=7200sCSnCl2=0.02mol / l, CHNO3=0.03mol / l, CKNO3=0.1mol / l, cDNA=0.1mg / l, dry in air;
[0042] Doping and annealing: S...
Example Embodiment
[0043] Example 1:
[0044] The comb-shaped electrode layer 2 after pretreatment was washed with ethanol and deionized water respectively on the surface of the electrode, and then the electrode was placed in an electrolytic cell for electrodeposition. The concentration of the electrolyte: CSnCl2 = 0.02mol / l CHNO3 = 0.03mol / l CKNO3=0.1mol / l CDNA=0.1mg / l, electrodeposition current: I=0.00008A, electrodeposition time: t=7200s, that is, a layer of SnO is deposited on the electrode surface 2 Thin-film sensitive material layer 3. Take out the electrode, dry it in the air, and then vaporize a 2nm thick gold layer on the surface of the film by sputtering technology, and finally anneal it in high-purity argon at 400℃ for 2h to prepare SnO at I=0.00008A. 2 film.
Example Embodiment
[0045] Example 2:
[0046] The comb-shaped electrode layer 2 after the pretreatment was washed with ethanol and deionized water respectively on the surface of the electrode, and then the electrode was placed in an electrolytic cell for electrodeposition. The concentration of the electrolyte: CSnCl2 =
[0047] 0.02mol / l CHNO3=0.03mol / l CKNO3=0.1mol / l CDNA=0.1mg / l, electrodeposition current: I=0.00016A. Electrodeposition time: t=7200s, that is, a layer of SnO is deposited on the electrode surface 2 Thin-film sensitive material layer 3, take out the electrode, dry it in air, then vaporize a 2nm thick gold layer on the surface of the film by sputtering technology, and finally anneal it in high-purity argon at 400℃ for 2h, and prepare it at I=0.00016A SnO under current 2 film.
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