Orientational alignment carbon nano-tube and carbon coating cobalt nano-particle complex and preparation thereof
A carbon-coated cobalt nanometer and particle composite technology, applied in nanostructure manufacturing, nanotechnology, nanotechnology and other directions, can solve the problems of long reaction time, difficult application, complicated methods, etc., and achieves high work efficiency and easy availability of raw materials. , the effect of simple operation
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Embodiment 1
[0030] Embodiment 1: the preparation method step of present embodiment is:
[0031] (1) Using radio frequency magnetron sputtering method, using Co as the target source and Ar as the discharge gas, deposit Co thin film on the Si substrate. Controlled sputtering equipment, the DC sputtering current is 0.1A, the DC sputtering voltage is 280V, the Ar gas flow rate is 60.2sccm, the working pressure is 0.5Pa, and the deposition time is 60s.
[0032] (2) Put the Co thin film that step (1) obtains into plasma-enhanced chemical vapor deposition equipment, and this deposition system is the JGP300A type high-vacuum single-target high-temperature coating equipment produced by the Shenyang Scientific Instrument Research and Development Center of the Chinese Academy of Sciences, vacuumed to 5Pa, Access O 2 The flow rate is 2sccm, the working pressure is 20Pa, and the temperature is raised to 800 degrees in 40 minutes at the beginning, so that the cobalt film is oxidized into very small co...
Embodiment 2
[0035] Embodiment 2: the preparation method step of this embodiment is:
[0036] (1) Using radio frequency magnetron sputtering method, using Co as the target source and Ar as the discharge gas, deposit Co thin film on the Si substrate. Controlled sputtering equipment, the DC sputtering current is 0.1A, the DC sputtering voltage is 280V, the Ar gas flow rate is 60.2sccm, the working pressure is 0.5Pa, and the deposition time is 60s.
[0037] (2) Put the Co thin film that step (1) obtains into plasma-enhanced chemical vapor deposition equipment, and this deposition system is the JGP300A type high-vacuum single-target high-temperature coating equipment produced by the Shenyang Scientific Instrument Research and Development Center of the Chinese Academy of Sciences, vacuumed to 5Pa, Access O 2 The flow rate is 2sccm, the working pressure is 20Pa, and the temperature is raised to 800 degrees in 40 minutes at the beginning, so that the cobalt film is oxidized into very small cobal...
Embodiment 3
[0040] Embodiment 3: the preparation method step of this embodiment is:
[0041] (1) Using radio frequency magnetron sputtering method, using Co as the target source and Ar as the discharge gas, deposit Co thin film on the Si substrate. Controlled sputtering equipment, the DC sputtering current is 0.1A, the DC sputtering voltage is 280V, the Ar gas flow rate is 60.2sccm, the working pressure is 0.5Pa, and the deposition time is 60s.
[0042] (2) Put the Co thin film that step (1) obtains into plasma-enhanced chemical vapor deposition equipment, and this deposition system is the JGP300A type high-vacuum single-target high-temperature coating equipment produced by the Shenyang Scientific Instrument Research and Development Center of the Chinese Academy of Sciences, vacuumed to 5Pa, Access O 2 The flow rate is 2sccm, the working pressure is 20Pa, and the temperature is raised to 800 degrees in 40 minutes at the beginning, so that the cobalt film is oxidized into very small cobal...
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