Method for preparing super-clean and high-purity isopropanol and apparatus thereof

A preparation device and technology for isopropanol, which are applied in the preparation of organic compounds, chemical instruments and methods, preparation of hydroxyl compounds, etc., can solve the problem of unstable quality of high-purity isopropanol products, low impurity content, and inability to meet ultra-large-scale integration. Circuit processing requirements and other issues, to achieve the effect of small footprint, large complex constant, and easy processing

Active Publication Date: 2009-02-11
JIANGYIN RUNMA ELECTRONICS MATERIAL
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Problems solved by technology

[0005] The purpose of the present invention is to overcome the unstable quality of high-purity isopropanol products produced by the prior art and cannot meet the shortcomings of VLSI processing requirements, and provide a process with strong continuity, good separation effect, high purity and low impurity content. The preparation method of ultra-clean high-purity isopropanol and device thereof

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  • Method for preparing super-clean and high-purity isopropanol and apparatus thereof

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Embodiment 1

[0012] Embodiment 1: the preparation method of ultra-clean high-purity isopropanol

[0013] A kind of preparation technology of ultra-clean high-purity isopropanol, first with industrial grade isopropanol (98%) raw material and the metal ion complexing agent that is 0.5%~5% of isopropanol raw material weight in complexing processor Mix, enter the dehydration processor at normal temperature and pressure for 30-120 minutes, mix with a dehydrating agent that is 0.1%-15% of the weight of isopropanol raw material at 60°C-100°C for 60-150 minutes, and then mix at 0.1-0.2 Under the operating pressure of MPa, it is filtered through the microfiltration membrane of the microfilter, and the filtrate enters the multi-stage rectification tower. Enter the finished receiver. In this embodiment, the metal ion complexing agent is an organosilicon polymer complexing agent prepared by addition of bisallyl crown ether and hydrogen-containing silicone oil; the bisallyl crown ether is bisallyl Ba...

Embodiment 2

[0018] Embodiment 2: the difference between this embodiment and embodiment 1 is: the described dehydrating agent is magnesium sulfate, calcium chloride, calcium hydride, acid anhydride or silica gel. The pressure selection for microfiltration membrane filtration is: 0.15 or 0.2MPa; the pressure selection for nanofiltration membrane filtration is: 0.6 or 0.8MPa.

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Abstract

The invention relates to a method for preparing super-clean and high-purity isopropanol and a device thereof, and the high-purity isopropanol is mainly suitable for cleaning in the manufacture industry of large scale integrated circuit semiconductor devices in the microelectronic industry. The method is as follows: firstly, the industrial grade isopropanol material with mass percentage to be 98 percent is mixed with a metal ion complexing agent with 0.5-5 percent of the weight of the isopropanol material in a complexing processor, under the normal temperature and pressure, after 30-120 minutes, the mixture is fed into a dehydrating processor, and then mixed for 60-150 minutes with a dehydrating agent with 0.1-15 percent of the weight of the isopropanol material under the temperature of 60 DEG C to 100 DEG C in the dehydrating processor, and then the mixture is filtered by the microfiltration membrane under the operation pressure of 0.1-0.2MPa, the filtrate enters into a multilevel rectification tower, and the semi-finished product from the tower is filtered by a nanofiltration membrane under the purifying environment and the operation pressure of 0.5-0.8MPa, and then is fed into a finished product acceptor. The method has the advantages of strong continuity, good separation effect, high purity and low impurity content. The device has the advantages of small occupied area, convenient automatic operation, stable quality and continuous production.

Description

(1) Technical field [0001] The invention relates to a method and a device for producing ultra-clean high-purity acetic acid. High-purity isopropanol is mainly suitable for cleaning in the microelectronics industry and the manufacture of large-scale integrated circuit semiconductor devices. It belongs to the technical field of microelectronic chemical reagents. (2) Background technology [0002] With the rapid development of semiconductor technology, the requirements for ultra-clean and high-purity reagents are getting higher and higher. In the processing of integrated circuits (IC), ultra-clean and high-purity reagents are mainly used for cleaning and etching the surface of chips and silicon wafers. Their purity and cleanliness have a great influence on the yield, electrical performance and reliability of integrated circuits. significant impact. As an important microelectronic chemical, ultra-clean and high-purity isopropanol has been widely used in the cleaning and dryin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C31/10C07C29/80
Inventor 戈士勇
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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