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Method for making nano lens array

A lens and nano technology, applied in the photoengraving process of lens and pattern surface, optics and other directions, can solve the problems of high production cost and long processing cycle of nano lens, and achieve low cost, controllable duty cycle and high efficiency. Effect

Inactive Publication Date: 2009-03-11
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The problem to be solved by the present invention is: to overcome the disadvantages of high production cost and long processing cycle of the prior art nano-lenses, make full use of the current relatively mature self-assembly technology, use nano-spheres as templates, and realize the production of nano-lenses through transfer

Method used

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  • Method for making nano lens array
  • Method for making nano lens array
  • Method for making nano lens array

Examples

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Embodiment 1

[0025] In this embodiment, fused silica is used as a substrate to fabricate a nanolens array with a diameter of 400 nm and a relief depth of 100 nm and 200 nm, respectively.

[0026] First, fused silica is used as the substrate, and the substrate is hydrophilized by chemical methods, such as figure 2 As shown in a; then 0.5μl of monodisperse polystyrene nanosphere hydrosol with a concentration of 3% and a diameter of 400nm is uniformly coated on the surface of the glass substrate, the solvent is slowly evaporated, and the colloidal spheres self-assemble into an array, such as figure 2 Shown in b; Reactive ion etching RIE is used to etch the self-assembled layer of polystyrene nanospheres to achieve the production of the required lens, such as figure 2 As shown in c; choose 1:1 etching rate ratio, adjust the etching power and reflection power and the flow of etching gas, control the etching rate of quartz at 20nm / min, after 5 minutes of etching, the formation period is 400nm, re...

Embodiment 2

[0028] In this embodiment, zinc selenide is used as the base to produce a nanolens array with a diameter of 6000 nm and a relief depth of 3000 nm; first, zinc selenide is used as the substrate, and the substrate is hydrophilized by a chemical method; then the concentration is 1%, and the diameter is 1%. 1.5μl of 8000nm polystyrene DVB copolymer particle suspension silicon microspheres are uniformly coated on the surface of the substrate to slowly evaporate the solvent, and the colloidal spheres self-assemble into an array; the polymer microspheres are self-assembled by inductively coupled plasma etching ICP The layer is etched, the etching rate ratio is controlled at 300nm / min, and the required lens is produced through 10min etching. The schematic diagram of the nanolens is shown as Figure 5 As shown, the diameter of the nano lens is 6000 nm, and the relief depth is 3000 nm.

Embodiment 3

[0030] In this embodiment, silicon is used as a substrate to fabricate a nanolens array with a diameter of 200 nm and a relief depth of 50 nm. Using silicon as the substrate, the substrate is hydrophilized by chemical methods; 0.5μl of monodisperse polystyrene nanosphere hydrosol with a concentration of 1% and a diameter of 200nm is uniformly coated on the surface of the substrate to self-assemble to form an array; adopt 5 % Concentration of HF solution is wet-etched, and the result is obtained after 3 minutes Figure 6 Nano lens shown.

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Abstract

The invention relates to a nano lens array preparation method, pertaining to the technical field of micro nano machining; the preparation method is characterized in that firstly a substrate is selected and a hydrophilization processing is carried out to the substrate; and then a self-assembly method is used for arranging nanospheres on the substrate; a transmission technology is used for transmitting the shape of the nanospheres onto the substrate to form the nano lens. The preparation method overcomes the defects of high production costs, long processing circle and the like of the nano lens in the prior art; the preparation method is characterized by no complex equipment, no mask, low cost, high efficiency, simple technology, and the like; simultaneously, the method also has the advantages of controllable caliber, arrangement method, vector height and duty ratio, thereby providing a simple new method with practicality for the production of the nano lens array.

Description

Technical field [0001] The invention relates to a micro-nano processing technology method, in particular to a method for manufacturing a nano-lens array. Background technique [0002] Nano-lens has a wide range of applications in new micro-nano-opto-electromechanical systems, such as high-density integrated optoelectronic systems such as biosensing, chemical sensing, and large data storage. Its preparation method is the key technology that needs to be solved in current research. The methods include electron beam direct writing lithography, focused ion beam lithography, interference lithography, etc., but the existing technologies all have disadvantages such as high cost and long processing cycle. [0003] On the other hand, because nano-scale microspheres have small size effects, surface effects and quantum size effects, and have responsiveness such as temperature, pH, electric field and magnetic field, they can be widely used in medical diagnosis, therapeutic drug delivery syste...

Claims

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Application Information

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IPC IPC(8): G03F7/00G02B3/00
Inventor 邓启凌杜春雷
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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