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Micro-nano structure bismuth pole for trace heavy metal detection and preparation method thereof

A technology of trace heavy metals and micro-nano structure, applied in the direction of material electrochemical variables, etc., can solve the problems of poor reproducibility, unfavorable detection of trace heavy metals, and low detection sensitivity

Inactive Publication Date: 2009-12-16
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, the existing bismuth thin film electrodes all use a layer of polycrystalline bismuth film prepared on the substrate as the working electrode, and the characteristic size of this electrode is greater than 25 μm, the reproducibility is poor, and the detection sensitivity is not high, which is not conducive to practice. Applied to trace heavy metal detection

Method used

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  • Micro-nano structure bismuth pole for trace heavy metal detection and preparation method thereof

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Embodiment 1

[0019] Copper foil is used as the working electrode to prepare the bismuth electrode of the two-dimensional bismuth micro-nano structure array. The thickness of the copper foil is 0.5mm, and the area is about 10×10mm 2 . Its preparation method comprises the following steps:

[0020] (1) Before depositing, a series of pretreatments should be carried out on the copper foil: first, the copper foil should be polished with metallographic sandpaper and abrasive paste to make the surface of the copper foil smooth and flat. The copper foil is ultrasonically assisted to remove the grease that may remain on the surface of the copper foil. Finally, it is rinsed with deionized water, dried with cold air, and stored for later use in depositing a thin film.

[0021] (2) Deposition of two-dimensional bismuth nanosheet arrays by constant potential method, the deposition potential is -0.15V (vs. SCE), the deposition time is 1500s, and the various chemical components in the electrolyte are: Bi...

Embodiment 2

[0024] Copper foil is used as the working electrode to prepare the bismuth electrode of the two-dimensional bismuth micro-nano structure array. The thickness of the copper foil is 0.5mm, and the area is about 10×10mm 2 . Its preparation method comprises the following steps:

[0025] (1) Before depositing, a series of pretreatments should be carried out on the copper foil: first, the copper foil should be polished with metallographic sandpaper and abrasive paste to make the surface of the copper foil smooth and flat. The copper foil is ultrasonically assisted to remove the grease that may remain on the surface of the copper foil. Finally, it is rinsed with deionized water, dried with cold air, and stored for later use in depositing a thin film.

[0026] (2) Deposition of two-dimensional bismuth nanosheet arrays by constant potential method, the deposition potential is -0.12V (vs. SCE), the deposition time is 1000s, and the various chemical components in the electrolyte are: Bi...

Embodiment 3

[0029] Using nickel foil as the working electrode to prepare the bismuth electrode of the two-dimensional bismuth micro-nano structure array, the thickness of the nickel foil is 0.5mm, and the area is about 10×10mm 2 . Its preparation method comprises the following steps:

[0030] (1) Before deposition, a series of pretreatments should be carried out on the nickel foil: first, the nickel foil should be polished with metallographic sandpaper and abrasive paste to make the surface of the nickel foil smooth and flat, and then polished with acetone and alcohol in sequence The nickel foil is ultrasonically assisted to remove the grease that may remain on the surface of the nickel foil, and finally rinsed with deionized water, dried with cold wind, and stored for future use in depositing thin films.

[0031] (2) Deposition of two-dimensional bismuth nanosheet arrays by constant potential method, the deposition potential is -0.18V (vs. SCE), the deposition time is 1000s, BiCl 3 40...

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Abstract

The invention discloses a micro-nano structure bismuth pole for trace heavy metal detection, which is a bismuth array of which the surface is allotted with a micro-nano dimension structure. The micro-nano structure bismuth array comprises a bismuth nano line or a bismuth nano piece, covers the surface of a pole by 20 percent to 70 percent, and effectively improves the effective surface area of the pole. The pole has simple preparation method and high detection sensitivity when being used for trace heavy metal detection and realizes the several-fold increase of the detection sensitivity of the pole.

Description

technical field [0001] The invention relates to the field of electrodes for trace heavy metal detection, in particular to a micro-nano structure bismuth electrode for trace heavy metal detection and a preparation method thereof. Background technique [0002] With the rapid development of modern industry and the fuel-based transportation industry, environmental pollution is also becoming more and more serious. Among them, the pollution of heavy metal ions such as lead, cadmium, chromium, arsenic, etc. is particularly dangerous. Because it cannot be degraded in the organism, it will also have adverse consequences under extremely small amounts of pollution. Therefore, the quantitative detection of trace heavy metal ions is important in environmental detection, Drug and food safety aspects are very important. The traditional electrochemical detection method of trace heavy metals in solution uses a mercury electrode as a working electrode for detection, but mercury and the mercu...

Claims

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Application Information

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IPC IPC(8): G01N27/30
Inventor 任山刘向阳
Owner SUN YAT SEN UNIV
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