Method for preparing flexible carbon nano tube transparent conductive thin-film material and electrodeposition device

A technology of transparent conductive film and carbon nanotubes, which is applied to the device for coating liquid on the surface, electrolytic coating, metal material coating process, etc., can solve the problem of poor adhesion between film and substrate, which limits the application of flexible transparent conductive film Difficult to achieve film continuity, large-area preparation, etc., to achieve the effect of small surface roughness, good transparent conductivity, and easy control of process parameters

Active Publication Date: 2010-02-24
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition to the spraying method, other methods are difficult to achieve continuous and large-area preparation of thin films
Moreover, ...

Method used

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  • Method for preparing flexible carbon nano tube transparent conductive thin-film material and electrodeposition device
  • Method for preparing flexible carbon nano tube transparent conductive thin-film material and electrodeposition device
  • Method for preparing flexible carbon nano tube transparent conductive thin-film material and electrodeposition device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1 As shown, the electrodeposition device includes an adjustable regulated DC power supply 1 and a rectangular electrophoresis tank 4 containing electrode sheets. The two plates in the electrophoresis tank 4: the positive plate 3 and the negative plate 2 are all made of stainless steel inert electrodes, the two plates are parallel to each other, and the area ratio of the positive and negative electrodes is 1:1-1:5. The carbon nanotube plating solution 5 is placed in the electrophoresis tank 4, the carbon nanotubes are deposited on the positive plate 3 to form a film, and the deposition surface is polished, and the surface roughness is less than 10nm.

[0029] Use the anionic surfactant sodium dodecyl sulfate (SDS) to separate the single-walled carbon nanotubes (in this embodiment, the specifications of the single-walled carbon nanotubes are: diameter 0.8-1.6nm, aspect ratio: 800-5000, weight purity 92%, volume resistivity 145S / cm) dispersed in aqueous sol...

Embodiment 2

[0032] Electrodeposition devices such as figure 1 .

[0033] Use the ionic surfactant sodium dodecylsulfonate (SDS) to separate the single-walled carbon nanotubes under the action of ultrasonic waves (in this embodiment, the specifications of the single-walled carbon nanotubes are: diameter 0.8~1.6nm, aspect ratio : 800~5000, weight purity 92%, volume resistivity 145S / cm) dispersed in aqueous solution, the consumption ratio (mass ratio) of carbon nanotube and surfactant is 1: 5. Subsequently, the dispersion liquid was centrifuged in a centrifuge, and the supernatant liquid was taken as a plating solution, and the content of carbon tubes in the plating solution was 0.02 mg / ml. Adjust the pH value of the plating solution to 11 with ammonia water. The electric field strength used for electrodeposition is 50V / cm, and the area ratio of positive and negative electrodes is 1:1. After 40 seconds of deposition, the positive stainless steel sheet was slowly taken out, rinsed with dis...

Embodiment 3

[0036] Electrodeposition devices such as figure 1 .

[0037] Use the ionic surfactant sodium dodecylbenzene sulfonate (SDBS) to separate the single-walled carbon nanotubes (in this embodiment, the specifications of the single-walled carbon nanotubes are: diameter 0.5-1.6nm, long diameter Ratio: 800-5000, weight purity 92%, volume resistivity 145S / cm) dispersed in aqueous solution, the dosage ratio (mass ratio) of carbon nanotubes and surfactant is 1:7. Subsequently, the dispersion liquid was centrifuged in a centrifuge, and the supernatant liquid was taken as a plating solution, and the content of carbon tubes in the plating solution was 0.02 mg / ml. Adjust the pH value of the plating solution to 11 with ammonia water. The electric field strength used for electrodeposition is 50V / cm, and the area ratio of positive and negative electrodes is 1:1. After 60 seconds of deposition, the positive stainless steel sheet was slowly taken out, rinsed with distilled water and then dried...

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Abstract

The invention relates to a method for preparing a flexible carbon nano tube transparent conductive thin-film material and an electrodeposition device, which are suitable for preparing uniform, high-transparency and high-conductivity flexible transparent conductive thin films. The method comprises: dispersing carbon nano tubes in aqueous solution by using an anionic surfactant under the action of ultrasonic waves, centrifuging the solution, using supernate as a plating solution and adding ammonia to make the plating solution alkaline; uniformly depositing the carbon nano tubes dispersed in theplating solution on a polished surface of a stainless steel electrode by using an electro-deposition method to obtain uniform carbon nano tube thin films with a thickness of 20 to 200 nanometers; andtransferring the carbon tube thin films to the surface of a flexible and transparent polymer substrate to form flexible, transparent and conductive thin films. The electrodeposition device mainly comprises an adjustable stabilized direct current power supply and a rectangular electrophoresis tank with a stainless steel inert electrode plate, wherein carbon nano tubes deposits on a polished positive plate to form films. The method and the electrodeposition device are simple and easily controllable in process parameters and can be used in large-area and continuous preparation of flexible, transparent and conductive films.

Description

technical field [0001] The invention relates to a method for preparing a flexible carbon nanotube transparent conductive film material and a special electrodeposition device, which are suitable for preparing a uniform flexible transparent conductive film with high transparent conductivity. Background technique [0002] Transparent conductive film refers to a film with high average transmittance and low resistivity to visible light (380-780nm), which has a wide range of applications in the field of electronics, such as: flat-panel displays, heat mirrors, transparent electromagnetic shielding materials, solar energy battery etc. [0003] Since Badker reported the formation of cadmium oxide (CdO) transparent conductive film by thermally evaporating cadmium (Cd) to oxidize it in 1907, the research of transparent conductive thin film has been paid more and more attention. At present, the most widely studied is the oxide film system (TCO), including: indium trioxide (In 2 o 3 )...

Claims

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Application Information

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IPC IPC(8): C23C26/00B05D5/12C25D13/02
Inventor 成会明裴嵩峰杜金红曾尤
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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