Preparation method of chromium nitride titanium aluminum nitrogen gradient hard reaction film

A technology of chromium nitride titanium aluminum nitrogen and chromium titanium nitride is applied in the field of preparation of nitrogen gradient hard reaction film, which can solve the problems affecting the use effect and service life of the hard film, the hardness and adhesion are difficult to satisfy at the same time, and the film layer Large internal stress and other problems, to achieve good stability and repeatability, reduce the cost of coating, reduce the effect of internal stress

Inactive Publication Date: 2010-05-12
SHENYANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] For the single-layer multi-component hard reaction film and the titanium-based multi-component hard reaction gradient film, there are mainly the following disadvantages: 1. The multi-component alloy target is not easy to buy in the market, and often requires special melting and processing. Not only the cost is high, but also the cycl

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] Preparation of CrTiAlN nitrogen gradient hard reaction film on commercial YT15 cemented carbide, the method is:

[0017] 1. Deposition technology and determination of target material composition: determine multi-arc ion plating as the preparation technology of CrTiAlN nitrogen gradient hard reaction film, select two arc sources with different orientations and arranged at 90 degrees to start arc deposition at the same time, one of the arc sources A chromium target with a purity of 99.99%, another arc source is a titanium-aluminum alloy target with a purity of 99.99%, and the atomic ratio of the titanium-aluminum alloy target is Ti:Al=50:50.

[0018] 2. Selection and pre-treatment of the workpiece: select commercial YT15 hard alloy as the workpiece material, and use metal detergent to degrease, decontaminate and polish the workpiece before putting it into the coating chamber for coating, and finally Ultrasonic cleaning with acetone and ethanol, blow dry with a hair dryer ...

Embodiment 2

[0025] Preparation of CrTiAlN nitrogen gradient hard reaction film on commercial YT15 cemented carbide, the method is:

[0026] 1. Deposition technology and determination of target material composition: determine multi-arc ion plating as the preparation technology of CrTiAlN nitrogen gradient hard reaction film, select two arc sources with different orientations and arranged at 90 degrees to start arc deposition at the same time, one of the arc sources A chromium target with a purity of 99.99%, another arc source is a titanium-aluminum alloy target with a purity of 99.99%, and the atomic ratio of the titanium-aluminum alloy target is Ti:Al=50:50.

[0027] 2. Selection and pre-treatment of the workpiece: select commercial YT15 hard alloy as the workpiece material, and use metal detergent to degrease, decontaminate and polish the workpiece before putting it into the coating chamber for coating, and finally Ultrasonic cleaning was performed with acetone and ethanol, and air-dried...

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PUM

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Abstract

The invention discloses a preparation method of a chromium nitride titanium aluminum nitrogen gradient hard reaction film. The preparation method sequentially comprises the steps of: firstly, deposition technology and determination of target elements; secondly, selection and pretreatment of workpieces; thirdly, determination of pre-bombardment technique; fourthly, determination of the deposition technique; fifthly, processing of vacuum heating; and sixthly, rotation of workpieces. In the invention, according to the method of preparing a multi-arc ion plated CrTiAlN nitrogen gradient hard reaction film by adopting a combination target of a chromium target and titanium aluminum alloy target, the CrTiAlN nitrogen gradient hard reaction film can be obtained; in addition, the nitrogen content of the CrTiAlN nitrogen gradient hard reaction film are distributed in gradient, the adhesive force is strong (not less than 150 N), and the hardness is high (not less than HV4200). The preparation method reduces the film coating cost, guarantees the synchronous realization of the high film layer hardness and adhesive force, reduces the internal stress of the film and has excellent stability and repeatability.

Description

Technical field: [0001] The invention relates to a method for preparing a nitrogen gradient hard reaction film, in particular to a method for preparing a multi-arc ion nitrogen-plating gradient hard reaction film by using a combined target, such as a chromium nitride titanium aluminum nitrogen gradient hard reaction film (hereinafter referred to as "" CrTiAlN" instead of "chromium titanium aluminum nitride") preparation method. Background technique: [0002] Multi-arc ion plating is a vacuum physical deposition technology with multiple cathode arc evaporation sources that can be evaporated simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is suitable for the preparation of hard films and hard reactive gradient films, and has been successfully applied in the preparation of titanium nitride, titanium aluminum nitride and more hard reactive films. Titanium aluminum nitride...

Claims

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Application Information

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IPC IPC(8): C23C14/32C23C14/06C23C14/02C23C14/58C23C14/54
Inventor 张钧吕会敏崔贯英井治贾恒娄军姚正辉
Owner SHENYANG UNIV
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